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Thermal and mechanical stress
modelling of smart power switches
under active loading
Bala Karunamurthy, KAI, Villach.
ACUM’14. Vienna
Infineon Technologies AG
65 % of reliability issues are
due to Thermo-mechanical loads
(M Glavanovics, KAI: ESSDRC 2004)
Stressed and Unstressed DMOS
Thermally induced loads cause failures
Electric pulses generate temperature
Delamination, cracks, voids, excessive
plastic deformation, metal crawling etc.
Metal Extrusion & Cracks
(T Smorodin, Infineon: ESSDRC 2007)
(W Kanert, Infineon: Journal of Microelectronics Reliability 2012)
Metal Degradation
Si Ingot Slicing Deposition/Etching
Chip Dicing Die Attach Moulding
Chris Welham, Coventor Inc.
Images: APCMag
How can we test a design/product?
Testing Vs Service conditions
Fundamental understanding
0
500
1000
1500
2000
2500
3000
3500
4000
4500
5000
A B C D
CTF
Design
0
500
1000
1500
2000
2500
3000
3500
4000
4500
5000
A B C D
CTF
Design
-40 to +150 C
0 to +80 C
Prof Peter Borgesen
Stress induced voiding (SIV) – process of diffusion and concentration of vacancies to form
voids
Flux, in atoms per unit area per time,
Mobility ; Where,
Driving Force Flux ,







kT
D
M
r
F H




kT
Q
eDD

 0





N
i i
Hi
i
kT
Q
r
VeD
kTAC
J
1
0 .

FMCAJ 
Where does the stress come from?
E1, ν1, α1
E2, ν2, α2
1. INTRINSIC: Film nucleation and coalescence
2. EXTRINSIC: CTE mismatch
E2, ν2, α2
E1, ν1, α1
Heat
Wafer Fabrication
Die Attach
Moulding
Temperature cycling
0
100
200
300
400
500
600
700
800
900
1000
1 2 3 4 5 6 7 8 9 10
Temperature(C)
Process Steps
1
2
3
4
Activate and deactivate element
Use ANSYS “Birth & Kill” Feature
The 5 Challenges
1. Structural complexity
2. Material Matrix
3. Multi-scale & Multi-physics
4. Computational Effort
5. Experimental Validation
(B Karunamurthy, KAI: Journal of Microelectronics)
(S Eiser, KAI)
Elastic, Elastic-Plastic, viscoelastic and visco-
plastic behaviour
Interface strength
Temperature dependent
Strain-rate dependency
Micro tensile experiments
Nanoindendation
4-point bending
Wafer curvature measurement
Lap shear and HCF/LCF Testing
ANSYS Input: BKIN, MKIN, Chaboche, Anand, Prony series etc. or USER MAT
What we need? Methods used
(V Kosel, KAI: 2011)
(G Kravchenko, 2011)
El.Therm Simulations
0
50
100
150
200
250
300
350
400
450
1 2 3 4 5 6
Power
Time (s)
σxy σyz σxz
¼ of Chip-
package
Die, Die
attach &
Lead frame
In-plane (σxy) and out-of-plane (σxz and σyz) on a chip
70 um
Silicon
Mould
Compound
Sub Model
Silicon
Silicon
Mould
Compound
Lead Frame
Just one surface: Half-a-million
elements!
Nested Sub-Modelling
Homogenization Technique
Micro Model
1
2
3
(B Karunamurthy, KAI: Techconnect, Washington 2013)
Stress peak regions correspond to failure sites
Fracture mechanics simulations
Crack and simulated stress state
Experimental validation
Stress
Modelling
Our ultimate goal?
Acknowledgements:
Funding bodies:
(FFG, Project no. 831163) and the Carinthian Economic
Promotion Fund (KWF, Contract KWF-15212274134186).
KAI & Infineon Technologies AG.
© CADFEM 2014
Produkte, Service und Wissen aus einer Hand
Denn Simulation ist mehr als Software
CADFEM (Austria) GmbH
Wagenseilgasse 14
1120 Wien
Tel. +43 (0)1 587 70 73 – 0
E-Mail. info@cadfem.at
Web. http://www.cadfem.at • http://blog.cadfem.at

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Thermal and mechanical stress modelling of smart power switches under active loading ANSYS

  • 1. Thermal and mechanical stress modelling of smart power switches under active loading Bala Karunamurthy, KAI, Villach. ACUM’14. Vienna
  • 3. 65 % of reliability issues are due to Thermo-mechanical loads (M Glavanovics, KAI: ESSDRC 2004) Stressed and Unstressed DMOS
  • 4. Thermally induced loads cause failures Electric pulses generate temperature Delamination, cracks, voids, excessive plastic deformation, metal crawling etc. Metal Extrusion & Cracks (T Smorodin, Infineon: ESSDRC 2007) (W Kanert, Infineon: Journal of Microelectronics Reliability 2012) Metal Degradation
  • 5. Si Ingot Slicing Deposition/Etching Chip Dicing Die Attach Moulding Chris Welham, Coventor Inc. Images: APCMag
  • 6. How can we test a design/product? Testing Vs Service conditions Fundamental understanding 0 500 1000 1500 2000 2500 3000 3500 4000 4500 5000 A B C D CTF Design 0 500 1000 1500 2000 2500 3000 3500 4000 4500 5000 A B C D CTF Design -40 to +150 C 0 to +80 C Prof Peter Borgesen
  • 7. Stress induced voiding (SIV) – process of diffusion and concentration of vacancies to form voids Flux, in atoms per unit area per time, Mobility ; Where, Driving Force Flux ,        kT D M r F H     kT Q eDD   0      N i i Hi i kT Q r VeD kTAC J 1 0 .  FMCAJ 
  • 8. Where does the stress come from? E1, ν1, α1 E2, ν2, α2 1. INTRINSIC: Film nucleation and coalescence 2. EXTRINSIC: CTE mismatch E2, ν2, α2 E1, ν1, α1 Heat
  • 9. Wafer Fabrication Die Attach Moulding Temperature cycling 0 100 200 300 400 500 600 700 800 900 1000 1 2 3 4 5 6 7 8 9 10 Temperature(C) Process Steps 1 2 3 4 Activate and deactivate element Use ANSYS “Birth & Kill” Feature
  • 10. The 5 Challenges 1. Structural complexity 2. Material Matrix 3. Multi-scale & Multi-physics 4. Computational Effort 5. Experimental Validation (B Karunamurthy, KAI: Journal of Microelectronics) (S Eiser, KAI)
  • 11. Elastic, Elastic-Plastic, viscoelastic and visco- plastic behaviour Interface strength Temperature dependent Strain-rate dependency Micro tensile experiments Nanoindendation 4-point bending Wafer curvature measurement Lap shear and HCF/LCF Testing ANSYS Input: BKIN, MKIN, Chaboche, Anand, Prony series etc. or USER MAT What we need? Methods used
  • 12. (V Kosel, KAI: 2011) (G Kravchenko, 2011) El.Therm Simulations 0 50 100 150 200 250 300 350 400 450 1 2 3 4 5 6 Power Time (s)
  • 13. σxy σyz σxz ¼ of Chip- package Die, Die attach & Lead frame In-plane (σxy) and out-of-plane (σxz and σyz) on a chip
  • 14. 70 um Silicon Mould Compound Sub Model Silicon Silicon Mould Compound Lead Frame Just one surface: Half-a-million elements! Nested Sub-Modelling Homogenization Technique Micro Model 1 2 3
  • 15. (B Karunamurthy, KAI: Techconnect, Washington 2013) Stress peak regions correspond to failure sites Fracture mechanics simulations Crack and simulated stress state
  • 17. Acknowledgements: Funding bodies: (FFG, Project no. 831163) and the Carinthian Economic Promotion Fund (KWF, Contract KWF-15212274134186). KAI & Infineon Technologies AG.
  • 18. © CADFEM 2014 Produkte, Service und Wissen aus einer Hand Denn Simulation ist mehr als Software CADFEM (Austria) GmbH Wagenseilgasse 14 1120 Wien Tel. +43 (0)1 587 70 73 – 0 E-Mail. info@cadfem.at Web. http://www.cadfem.at • http://blog.cadfem.at

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