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- 4. 3 mask Capacitor Reticle– 871AZ Dielectric constant PolyGate SiO 2 Si Substrate Area A -Q E Separation d Area A +Q V
- 6. 871AZ Layout and Fabrication Underlap Structures Overlap Structures MultiDot Structures Transistors CV structures Dummy Fill Transistors CV structures FG Caps with sub FG Caps w/o sub Underlap Structures Overlap Structures MultiDot Structures Transistors CV structures Overlap Structures MultiDot Structures Transistors CV structures Large Caps UHFs Exposure Etch Deposition
- 9. 3D Reticle Multiple Wafer to Wafer Direct Copper Bonding Donor wafer aligned to substrate wafer
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