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A
Presentation
On
SOI Devices
Presented by:
Aalam Khan
1JNU ECE CA12014 SOI TECH
OutlinesOutlines
• Introduction
• SOI Technologies
• Advantages Of SOI
• SOI Devices
• Applications
• Conclusion
• References
JNU ECE CA12014 SOI TECH 2
IntroductionIntroduction
• Increasing demand of high performance, low
power, small area can be achieved by SOI Tech.
• SIO2 layer is created by flowing oxygen onto silicon
wafer.
• Insulating layer reduces junction capacitance and
also reduce power consumption.
• Floating body
• Less area because no metal contact to wells
JNU ECE CA12014 SOI TECH 3
4
depletion region
Thin body
JNU ECE CA12014 SOI TECH
Partially Depleted vs. Fully-DepletedPartially Depleted vs. Fully-Depleted
• Partially-depleted SOI
o The body is thicker than the depletion region, so bulk
voltage can vary depending on the amount of charge
present
o This varying charge changes Vt because of the body
effect
• Fully-depleted SOI
o Body is thin, depletion region spans bulk
o Body charge is fixed, body voltage does not change
o Harder to make because of thin body
5JNU ECE CA12014 SOI TECH
SOI TECNOLOGIESSOI TECNOLOGIES
• SOS (Silicon-On-Sapphire)
• SIMOX (Separation by IMplanted OXygen)
• BESOI (Bond and Etch-back SOI)
• Smart- Cut®
• ELTRAN® (Epitaxial Layer TRANsfer)
6JNU ECE CA12014 SOI TECH
JNU ECE CA12014 SOI TECH 7
JNU ECE CA12014 SOI TECH 8
SIMOX SOI TechnologySIMOX SOI Technology
• High oxygen dose(standard)
• 1.8E18/cm2, 200 kev
• low dose + high temp. oxidation
• Oxygen implanter development
• High current, low contamination, uniformity
JNU ECE CA12014 SOI TECH 9
JNU ECE CA12014 SOI TECH 10
JNU ECE CA12014 SOI TECH 11
JNU ECE CA12014 SOI TECH 12
AdvantagesAdvantages
JNU ECE CA12014 SOI TECH 13
Benefits of SOIBenefits of SOI
• Simple Isolation
• Higher Density
• Reduced S/D junction capacitance
• No latch up
• Low soft Errors
• Speed Increases
• Less Power consumsion
• Less area
JNU ECE CA12014 SOI TECH 14
JNU ECE CA12014 SOI TECH 15
Fully depleted SOI
FD-SOI
Implementation
ARM7
SOI provides a viable low-power solution
1/3 power consumption
of bulk device with
same performance
JNU ECE CA12014 SOI TECH 16
The inherent advantages of SOI are essential today
• Compared to bulk-CMOS, SOI technology offers
–
–
–
–
–
Lower power, 30- 40% lower power (or higher
performance)
Less process complexity and variability
More reliable: 10x soft error rate reduction and no
latch up
FD- SOI/ FinFET: stable SRAMs
Simplifies Digital, Analog and RF integration in SoCs
SOI DisadvantagesSOI Disadvantages
• Floating body causes the History Effect
o This changes Vt, which changes the delay of the circuit
• Self-heating
• Modeling issues
17JNU ECE CA12014 SOI TECH
Commercialized SOI WafersCommercialized SOI Wafers
• SOS : Kyocera, Union Carbide, Asahi kasei
• SIMOX : IBIS(Mitsubishi)
: NSC, Komatsu(NTT)
• Bond and layer transfer SOI
• :SOITEC,Canon,SiGen
• BESOI : Isonics, BCO, Hughes, SiBond
JNU ECE CA12014 SOI TECH 18
Present SOI Device and CircuitsPresent SOI Device and Circuits
• IBM : CPU with 300mm, 0.1 micron, Cu
• Motorola : commercial G4, 2GHz G5 power PC
• Intel : DST- sub 30nm TSOI, sub 70nm gate
• AMD :mobile,space,64bitMPU
• Honeywell : Rad-hard, space application
• HP : 64-bit RISC processor with copper
• IBM, Toshiba, Sony : supercomputer-on-chip
JNU ECE CA12014 SOI TECH 19
Present SOI Device and Circuits 2Present SOI Device and Circuits 2
•Hitachi : mainframe computers
•Mitsubishi : RF/anlog devices
•Epson : low-voltage ASICs
•Fujitsu : high-speed logic devices (adder circuit)
•Seiko, Casio : wrist watch chip
•Oki : low power high speed rf devices
•TSMC : 90 nm MOSFET with SOI
JNU ECE CA12014 SOI TECH 20
ApplicationsApplications
• Low power, high speed IC
• ULSI Circuit
• Rad-hard IC
• High power device
• High temperature device
• Si MMIC
• Sensor & MEMS application
JNU ECE CA12014 SOI TECH 21
I
(In
SOI is part of your daily life!
Computing
Gaming
VN
Vehicle Networking)
Automotive
Quad-Core
DSP MSC8144
Networking
Images, Ultra LP
22JNU ECE CA12014 SOI TECH
Tilted 3-D cross section
of a FinFET on SOI
Emerging
SOI application:
FinFETs manufacturing low
variability & low cost
Challenge: In bulk-CMOS it’s
difficult to achieve an exact fin-height
and minimize this additional variability.
Film
Thickness
23JNU ECE CA12014 SOI TECH
Emerging
SOI application:
Optical waveguides
Challenge: To minimize signal
loss and cost for optical interconnects
both noise isolation and precision
manufacturing are essential for highly
integrated solutions.
24JNU ECE CA12014 SOI TECH
Emerging
SOI application:
CMOS image sensor
Challenge: Less expensive
cameras and mobile phones demand
small and low-cost image sensors, without
trading off sensitivity or quantum efficiency.
Light passing through
a thinned silicon wafer
25JNU ECE CA12014 SOI TECH
Emerging
SOI application:
Zero-Capacitor RAM
Challenge: SOC's memory content is
constantly increasing.
High-density, low-cost and low-power
memories are essential for many systems.
26JNU ECE CA12014 SOI TECH
JNU ECE CA12014 SOI TECH 27
SOI / XDM10 process
> 350V D-S
breakdown
Emerging
SOI application:
High-voltage switching
Challenge: Car batteries will increase to
48V, hybrid batteries
output 200 – 300V and > 100A currents.
JNU ECE CA12014 SOI TECH 28
26 members so far, focused on reducing power
The SOI Industry Consortium
includes leaders in the
electronics industry from users
& enablers to suppliers &
manufacturers
ConclusionConclusion
• After studying the various circuit issues of both the
technologies. SOI gives the superior results than Bulk
technology, which increases
• The circuit performances, high reliability, removes
the parasitic capacitance, punch through issue
and the circuit compactness.
• Hence SOI technology is the leading and
upcoming technology in both micro and nano
electronics.
JNU ECE CA12014 SOI TECH 29
SOI ReferencesSOI References
• Proceedings
• ECS SOI symposium proceedings
• IEEE SOI conference proceedings
• Consortium industry
• TEXT
• J.B.Kuo : CMOS VLSI Engineering : Silicon on
insulator
JNU ECE CA12014 SOI TECH 30
Thank you
31JNU ECE CA12014 SOI TECH

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Soi aalam

  • 1. A Presentation On SOI Devices Presented by: Aalam Khan 1JNU ECE CA12014 SOI TECH
  • 2. OutlinesOutlines • Introduction • SOI Technologies • Advantages Of SOI • SOI Devices • Applications • Conclusion • References JNU ECE CA12014 SOI TECH 2
  • 3. IntroductionIntroduction • Increasing demand of high performance, low power, small area can be achieved by SOI Tech. • SIO2 layer is created by flowing oxygen onto silicon wafer. • Insulating layer reduces junction capacitance and also reduce power consumption. • Floating body • Less area because no metal contact to wells JNU ECE CA12014 SOI TECH 3
  • 4. 4 depletion region Thin body JNU ECE CA12014 SOI TECH
  • 5. Partially Depleted vs. Fully-DepletedPartially Depleted vs. Fully-Depleted • Partially-depleted SOI o The body is thicker than the depletion region, so bulk voltage can vary depending on the amount of charge present o This varying charge changes Vt because of the body effect • Fully-depleted SOI o Body is thin, depletion region spans bulk o Body charge is fixed, body voltage does not change o Harder to make because of thin body 5JNU ECE CA12014 SOI TECH
  • 6. SOI TECNOLOGIESSOI TECNOLOGIES • SOS (Silicon-On-Sapphire) • SIMOX (Separation by IMplanted OXygen) • BESOI (Bond and Etch-back SOI) • Smart- Cut® • ELTRAN® (Epitaxial Layer TRANsfer) 6JNU ECE CA12014 SOI TECH
  • 7. JNU ECE CA12014 SOI TECH 7
  • 8. JNU ECE CA12014 SOI TECH 8
  • 9. SIMOX SOI TechnologySIMOX SOI Technology • High oxygen dose(standard) • 1.8E18/cm2, 200 kev • low dose + high temp. oxidation • Oxygen implanter development • High current, low contamination, uniformity JNU ECE CA12014 SOI TECH 9
  • 10. JNU ECE CA12014 SOI TECH 10
  • 11. JNU ECE CA12014 SOI TECH 11
  • 12. JNU ECE CA12014 SOI TECH 12
  • 14. Benefits of SOIBenefits of SOI • Simple Isolation • Higher Density • Reduced S/D junction capacitance • No latch up • Low soft Errors • Speed Increases • Less Power consumsion • Less area JNU ECE CA12014 SOI TECH 14
  • 15. JNU ECE CA12014 SOI TECH 15 Fully depleted SOI FD-SOI Implementation ARM7 SOI provides a viable low-power solution 1/3 power consumption of bulk device with same performance
  • 16. JNU ECE CA12014 SOI TECH 16 The inherent advantages of SOI are essential today • Compared to bulk-CMOS, SOI technology offers – – – – – Lower power, 30- 40% lower power (or higher performance) Less process complexity and variability More reliable: 10x soft error rate reduction and no latch up FD- SOI/ FinFET: stable SRAMs Simplifies Digital, Analog and RF integration in SoCs
  • 17. SOI DisadvantagesSOI Disadvantages • Floating body causes the History Effect o This changes Vt, which changes the delay of the circuit • Self-heating • Modeling issues 17JNU ECE CA12014 SOI TECH
  • 18. Commercialized SOI WafersCommercialized SOI Wafers • SOS : Kyocera, Union Carbide, Asahi kasei • SIMOX : IBIS(Mitsubishi) : NSC, Komatsu(NTT) • Bond and layer transfer SOI • :SOITEC,Canon,SiGen • BESOI : Isonics, BCO, Hughes, SiBond JNU ECE CA12014 SOI TECH 18
  • 19. Present SOI Device and CircuitsPresent SOI Device and Circuits • IBM : CPU with 300mm, 0.1 micron, Cu • Motorola : commercial G4, 2GHz G5 power PC • Intel : DST- sub 30nm TSOI, sub 70nm gate • AMD :mobile,space,64bitMPU • Honeywell : Rad-hard, space application • HP : 64-bit RISC processor with copper • IBM, Toshiba, Sony : supercomputer-on-chip JNU ECE CA12014 SOI TECH 19
  • 20. Present SOI Device and Circuits 2Present SOI Device and Circuits 2 •Hitachi : mainframe computers •Mitsubishi : RF/anlog devices •Epson : low-voltage ASICs •Fujitsu : high-speed logic devices (adder circuit) •Seiko, Casio : wrist watch chip •Oki : low power high speed rf devices •TSMC : 90 nm MOSFET with SOI JNU ECE CA12014 SOI TECH 20
  • 21. ApplicationsApplications • Low power, high speed IC • ULSI Circuit • Rad-hard IC • High power device • High temperature device • Si MMIC • Sensor & MEMS application JNU ECE CA12014 SOI TECH 21
  • 22. I (In SOI is part of your daily life! Computing Gaming VN Vehicle Networking) Automotive Quad-Core DSP MSC8144 Networking Images, Ultra LP 22JNU ECE CA12014 SOI TECH
  • 23. Tilted 3-D cross section of a FinFET on SOI Emerging SOI application: FinFETs manufacturing low variability & low cost Challenge: In bulk-CMOS it’s difficult to achieve an exact fin-height and minimize this additional variability. Film Thickness 23JNU ECE CA12014 SOI TECH
  • 24. Emerging SOI application: Optical waveguides Challenge: To minimize signal loss and cost for optical interconnects both noise isolation and precision manufacturing are essential for highly integrated solutions. 24JNU ECE CA12014 SOI TECH
  • 25. Emerging SOI application: CMOS image sensor Challenge: Less expensive cameras and mobile phones demand small and low-cost image sensors, without trading off sensitivity or quantum efficiency. Light passing through a thinned silicon wafer 25JNU ECE CA12014 SOI TECH
  • 26. Emerging SOI application: Zero-Capacitor RAM Challenge: SOC's memory content is constantly increasing. High-density, low-cost and low-power memories are essential for many systems. 26JNU ECE CA12014 SOI TECH
  • 27. JNU ECE CA12014 SOI TECH 27 SOI / XDM10 process > 350V D-S breakdown Emerging SOI application: High-voltage switching Challenge: Car batteries will increase to 48V, hybrid batteries output 200 – 300V and > 100A currents.
  • 28. JNU ECE CA12014 SOI TECH 28 26 members so far, focused on reducing power The SOI Industry Consortium includes leaders in the electronics industry from users & enablers to suppliers & manufacturers
  • 29. ConclusionConclusion • After studying the various circuit issues of both the technologies. SOI gives the superior results than Bulk technology, which increases • The circuit performances, high reliability, removes the parasitic capacitance, punch through issue and the circuit compactness. • Hence SOI technology is the leading and upcoming technology in both micro and nano electronics. JNU ECE CA12014 SOI TECH 29
  • 30. SOI ReferencesSOI References • Proceedings • ECS SOI symposium proceedings • IEEE SOI conference proceedings • Consortium industry • TEXT • J.B.Kuo : CMOS VLSI Engineering : Silicon on insulator JNU ECE CA12014 SOI TECH 30
  • 31. Thank you 31JNU ECE CA12014 SOI TECH