2. Purpose of the paper is connect the dots:
• Structure-Process-Properties of biax oriented shrink film
• Resins-Equipment-Applications
Specifically the presentation will focus on:
• Material:
Nova Chemical, US Patent: 6,340,532: 2002
Shrink Film
• Equipment
Sealed Air’s US Patent: 8,012,572: 2011
Microlayering die technology
Schirmer’s US Patent: 8,870,561: 2014
Nanolayering die technology
Introduction
3. Biax shrink film shrinks around a product when heated closed to the
melting point
Typical resins used to manufacture shrink films include:
• Polyvinyl chloride (PVC)
• Polypropylene (PP)
• Linear-low density polyethylene (LLDPE)
• Low density polyethylene (LDPE)
• High density polyethylene (HDPE)
• Copolymers of ethylene and vinyl acetate (EVA)
• Copolymers of ethylene and vinyl alcohols (EVOH)
• Ionomers (e.g. Surlyn™)
• Copolymers of vinylidene chloride (e.g. PVDC, SARAN™)
• Copolymers of ethylene acrylic acid (EAA)
• Polyamides (PA)
Introduction – Basic Shrink Film
5. Key Critical Properties of Shrink Film Include:
• Free Shrink
• Shrink Force
• Dart Impact
• Tear Strength
• Stiffness
• Haze
• Gloss
• Burn Through Resistance, melt strength
Biax Shrink Film Manufacturing Processes Include:
• Tenter Frame
• Double bubble blown film
• Triple bubble blown film
Introduction- Shrink Film
6. Both Material and Die Technology information is organized
as outlined below:
• Objective
• Experimental Procedure
Resins
Equipment Description
Process Conditions
Trial Design: Variables
• Results
• Discussion
• Conclusion
Introduction
7. Structure-Process-Property ultimately determines Film Properties
Introduction
Resin Characterization Equipment Design Process Conditions
MW
MWD
Branching
Crystallinity
Functionalit
y
Screw Design
Die Design
Die Gap
Cooling
Blow-Up Ratio (BUR)
Drawn Down Ratio
Frost Line Height
Specific Output
Film Properties
Structure Process
9. BACKGROUND
• At E.I. DuPont Clysar, Developed and patented a
monolayer LLDPE shrink film to compete against Sealed
Air’s D-955 coex shrink film
• At Dow Chemical, Developed PE resins
• At Nova Chemical, served as Technical Manager
Dual reactor solution LLDPE development project
• Sealed Air was Nova’s a development partner in this
project
Dual Reactor Solution LLDPE Development
10. In 2002 the following LLDPE resins existed:
• ZN-LLDPE
Organoleptic issues – low MW fraction
Inferior impact strength
• mLLDPE
Good organoleptic and impact strength
Inferior tear strength
Low melt strength, bubble stability issues
Nova’s Objective:
• Develop a LLDPE resin to mitigate deficiencies
Introduction
- Non-Uniform
mLLDPE - Uniform
11. Produce experimental resins on dual reactor process:
Fabricate experimental films on Soten’s double bubble
blown film equipment
Analyze physical properties, present results to develepment
partner
Evaluate experimental film on typical packaging equipment
Experimental Procedure
12. Dual Reactor Solution Process Variables:
• Number of reactors: Dual or Single
• Catalyst: Advanced vs Existing
• % Comonomer: Rx1, Rx2, Both
• Reactor Stirring Tech: Experimental vs Existing
LLDPE Resin Characteristic Variable Targets:
• Melt Index (g.10 min): 0.5; 1.0
• MWD (SEx): 1.37, 1.35, 1.40, 1.29
• Density (g/cc): 0.920, 0.914
• COHO ratio: 4.4, 3.7
Experimental Procedure: Trial Design
13. Experimental Procedure: Resins
Resin 1 Resin 2 Resin 3 Resin 4 Resin 5
Experimental Resin R1 R2-c R3 R4 R5
Description Dual RX Dual RX Dual RX Single RX Single RX
High C8 in Rx1 Low C8 in Rx1 C8 in Rx1 & Rx2
MI2 (g/10 min) 0.50 0.57 0.57 1.00 0.50
Density (g/cc) 0.9195 0.9202 0.9141 0.9210 0.9190
MWD (S E x) 1.37 1.35 1.40 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
14. Experimental Procedure: Resin
Comonomer Content in High Molecular Weight Region
GPC-TREF Technique
4
6
8
10
12
14
16
5 5.2 5.4 5.6 5.8 6
Log Molecular Weight
#ofBranches/1000Carbons
Dual Rx - High C8
Dual Rx - Low C8
11G1
Molecular Weight = 350,000
Single Rx
Log Molecular Weight
#ofBranches/100carbonatoms
GPC-TREF Plot
Comonomer Content in High MW Region
5.0 5.2 5.4 5.6 5.8 6.0
0.4
0.35
0.30
0.25
0.20
0.15
0.10
0.05
0
Single Rx
Old Catalyst
Adv CatalystAdv Catalyst
Adv Catalyst
15. Soten Double Bubble Blown Film Line
Experimental Procedure:
Equipment Description
16. Experimental Procedure:
Equipment Description
Extruder Layer Diameter L/D
1. External 50mm (1.97 in) 38
2. Intermediate 60mm (2.36 in) 32
3. Central 70mm (2.75 in) 33
4. Intermediate 60mm (2.36 in) 32
5. Internal 50mm (1.97 in) 38
Die Size 240 mm (9.45 in)
Die gap 1.5 mm (60 mil)
Air Ring 1 high pressure
Air Ring 2 low pressure, high volume
Air Ring 3 low pressure, high volume
17. Experimental Procedure:
Blown Film Process Conditions
Barrel Zones 180 - 230 C (356 - 446 F)
Die 220 C (428 F)
Melt Temp. 225 C (437 F)
Cooling Water 15 C (60 F)
Cooling Air 10 C (50 F)
Stretch Ratio 5 X 5
Orient. Temp 101 C (213 F)
Output (Kg/hr) 100 (220 lbs/hr)
Lay Flat 1700 mm (67 in)
18. Experimental Procedure
Shrink Packaging Trial
Shrink Wrapped Booklets
Shrink Tunnel: Elantech
Experimental films evaluated:
• Oven Temperatures:
125 C, 150 C, 175 C, 200 C
• Conveyer belt speed range:
2 to 42 fpm
19. Experimental Procedure
Shrink Packaging Trial
Defects:
• Dog Ears, Wrinkles
• Burn-Through
Results reported:
• Min and Max conveyor speed
Achieved “Perfect” packages
at each temp.
Represents the Processing
Window
20. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 Rx 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1 0.5
Density (g/cc) 0.919 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
21. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 Rx 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1.0 0.5
Density (g/cc) 0.9195 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
22. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 Rx 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1.0 0.5
Density (g/cc) 0.919 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
23. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 Rx 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1.0 0.5
Density (g/cc) 0.9195 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
24. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 RX 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1.0 0.5
Density (g/cc) 0.9195 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
25. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 RX 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1.0 0.5
Density (g/cc) 0.9195 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
26. Film Physical Properties Results
Experimental Resin R1 R2-c R3 R4 R5
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 1 RX 1 Rx
MI2 (g/10 min) 0.5 0.57 0.57 1.0 0.5
Density (g/cc) 0.9195 0.9202 0.9141 0.921 0.919
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
27. Shrink Packaging Performance
Experimental Resin R1 R2-c R3 R4 R5 C1 C2 C3 C4
Description High C8 in Rx1 Low C8 in Rx1 Low C8 in Rx1 Single RX Single RX Single RX Single RX Film 1 Film 2
MI2 (g/10 min) 0.50 0.57 0.57 1.00 0.50 0.72 1.00 Coex Monlayer
Density (g/cc) 0.920 0.920 0.914 0.920 0.920 0.920 0.920 Crosslinked Crosslinked
MWD (S E x) 1.37 1.35 1.4 1.34 1.29
COHO** 4.4 3.7 4.7 3.7 4.4
Dual RX solution resins perform
better than commercial shrink film
products, except R4
28. The experimental films exhibit excellent physical properties
Note: Experimental films are not:
• Multilayer structures
• Cross-linked
As a result of this work, ZN-LLDPE Product Line was
developed, patented and commercialized
• $1 Billion investment
• 1 Billion lbs./yr. capacity
• Specifically, LLDPE (1.0 MI, 0.920 g/cc) for shrink film
applications
Conclusions
29. Resin: How It Works
Control of MWD with Multiple Reactors
Different but Distinct species in each reactor - influence the position and
concentration of the MW component of the polymer structure
30. Resin Structure: Conventional vs Bimodal
Resin Structure can be optimized by controlling MI, Density, MWD of each species in the dual
reactor process
•Reactor split controls the overall MWD
•C8 added to RX1 (High MW fraction) to improve strength
•Smaller amount of RX2 (Low MW fraction) to reduces organoleptic and smoke issues
Taste,
Odor,
Smoke,
Migration
Processability
Lubrication
Mechanical
Strength,
Tie Molecules
Processability,
melt strength,
orientation
development
Conventional
Bimodal
1 2 3 4 5
32. Sealed Air’s Objective:
Internally develop the annular microlayering die technology in
order to establish a competitive advantage in manufacturing:
• Thinner films
• Superior performance
• Less raw materials used
• Significant cost reduction
Annular Microlayered Shrink Film
Sealed Air Patent: 8,012,572
39. F1-F3 Conventional film; 3 and 5 layer coex
F3 is 0.6 mil, all others 0.3 mils thick
F4, F10, F11, and F12 have greatest difference in alternating “Hard/”Soft”
layers
F1 and F4: same resins; Conventional vs Microlayered
Annular Conventional vs Microlayer Shrink Film
Microlayered
Conventional vs Microlayer
Same Resins: MDPE/LDPE Greatest difference between
“Hard” – “Soft” Layers
40. The major attribute in the finished film:
Create an “I-beam” effect by
alternating and repeating “hard/soft”
layers
The repeated layering of two materials
with a different properties can create a
new film that can exceed the average or
the maximum value of the individual
layers.
Normally “I” beam effect is applied to
the tensile strength characteristics
• However, with nanolayered film the
I-beam effect improves:
Tear
Puncture
Elongation
Secant modulus
Annular Conventional vs Microlayer Shrink Film
41. Annular Conventional vs Microlayer Shrink Film
F3: Conventional at 0.6 mils, F4 –F25 microlayered at 0.3 mils
F4 microlayered at half the thickness of F3 but equivalent Tear
F4 microlayered with alternating “Hard” / “Soft” layers, also F10, F11, F12
F2 and F3: Same resins, Conventional 0.30 and 0.6 mils respectively, half the thickness and half
the tear
0.6 mils Conventional vs 0.3 mils
Microlayer Microlayered: Hard/Soft alternating layers
42. Annular Conventional vs Microlayer Shrink Film
Sample F1-F3 fabricated with standard annular plate die, 3 or 5 layers
F3 is 0.6 mils conventional film; All others 0.3 mils thick
F4 – F25 Microlayered Film
F13, F14, F15 oriented 6X6
Oriented 6X6; others 5x5
F3 0.6 mils Conventional vs F4 0.3 mils Microlayer
43. Annular Conventional vs Microlayer Shrink Film
F1-F3 fabricated with standard annular plate die
F3 conventional 0.6 mil film; F4 – F25 microlayered 0.3 mil film
F3 has superior impact strength as compared to thinner or microlayered films
44. Annular Conventional vs Microlayer Shrink Film
F10, F11, F12 have the greatest difference in Hard/Soft alternating microlayers
F17, F18, F19 have repro included
48. 1. Microlayered film:
• 50% thinner than conventional film
• Equivalent physical properties
2. Layer sequencing microlayers creates I-beam effect which significantly
improves physical properties
3. Less expensive material could be substituted without sacrificing performance
4. More reclaimed material can be added without sacrificing performance
5. Thinner layers of expensive material (EVOH, PA, Tie Resins) with equivalent
barrier performance
6. To connect the dots: Commercial dual reactor ZN-LLDPE – used in
microlayered film structures
Annular Microlayered Shrink Film
Conclusions
50. • US Patent: 6,413,595, Schrimer, 2002
– Modular Disc Co-extrusion Die
• US Patent: 8,870,561, Schirmer, 2014
– Layer Sequence Repeater Module (LSR) for the Modular Disc
Co-Extrusion Die
– Patents awarded
• USA
• Canada
• Europe
• China
History & Design of the
Annular Nanolayering Modular Disc Die
51. • A Nanolayer is an order of magnitude thinner than a
microlayer
Microlayer vs Nanolayer
Practical limit for Microlayer
Practical limit of nanolayering is 100
times thinner than microlayering!
Microns Mils
3 1.118
0.03 0.001Practical limit for Nanolayer
52. Annular Nanolayering Film Technology
Die Design
• Modular Disc Die Design
• Layer Sequence Repeater
All Microlayers
All Nanolayer
53. • Nanoscale confinement demonstrates dramatic
changes in crystallization
• Confined crystallization of polymers leads to the
formation of oriented lamellae in nanolayered films
• The oriented lamellae increase the tortuitous
pathway with increasing the lamellar orientation
thereby improving the barrier performance
• As the layer thicknesses approached a few
nanometers, lamellar morphologies in HDPE layers
resembled “single crystal” structures
• Note: the results of nanolayering film depends on
material used
Nanolayering Mechanism
Gas Barrier Properties
55. • Annular Nanolayer Die Technology commercially available
• Annular Nanolayering technology provides equivalent or greater capabilities
as compared to Microlayering technology
– Microlayering is limited to 29 layers
– Nanolayering is limited to greater than 29 layers
• Microlayering/Nanolayering technology is applicable in the following film
processes:
– Blown Conventional, Double Bubble, Triple Bubble, Downward Water Quench
– Cast Conventional, Round Cast (Downward Water Quench)
– MDO
– Tenter Frame Sequential, Simultaneous
– Extrusion Coating, Laminations
Annular Nanolayer Film Summary