Patents by Applied Microstructures, Inc.

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applied microstructures & boris kobrin
1 of 12 11/27/14, 12:23 PM

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Controlled vapor deposition of biocompatible
coatings over surface-treated substrates
Application number: 20060088666
Abstract: We have developed an improved vapor-phase
deposition method and apparatus for the application of
layers and coatings on various substrates. The method
and apparatus are useful in the fabrication of
biofunctional devices, Bio-MEMS devices, and in the
fabrication of microfluidic devices for biological
applications. In one important embodiment, a siloxane
substrate surface is treated using a combination of
ozone and UV radiation to render the siloxane surface
more hydrophilic, and subsequently a functional coating
is applied in-situ over the treated surface of the siloxane
substrate.
Type: Application
Filed: December 5, 2005
Issued: April 27, 2006
Assignee: APPLIED MICROSTRUCTURES, INC.
Inventors: Boris Kobrin, Jeffrey Chinn, Romuald Nowak
Controlled vapor deposition of biocompatible
coatings over surface-treated substrates
Patent number: 7695775
biofunctional devices, Bio-MEMS devices, and in the
NARROW RESULTS
Filter by US Classification
120
427/248.1 (8)
427/255.7 (5)
438/763 (3)
427/255.18 (2)
427/255.23 (2)
427/255.27 (2)
427/255.6 (2)
257/642 (2)
422/130 (1)
427/491 (1)
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2 of 12 11/27/14, 12:23 PM

fabrication of microfluidic devices for biological
applications. In one important embodiment, a siloxane
substrate surface is treated using a combination of
ozone and UV radiation to render the siloxane surface
more hydrophilic, and subsequently a functional coating
is applied in-situ over the treated surface of the siloxane
substrate.
Type: Grant
Issued: April 13, 2010
Assignee: Applied Microstructures, Inc.
Inventors: Boris Kobrin, Jeffrey D. Chinn, Romuald
Nowak
Protective thin films for use during fabrication of
semiconductors, MEMS, and microstructures
Abstract: A method of protecting a substrate during
fabrication of semiconductor, MEMS, or biotechnology
devices. The method includes application of a
protective thin film which typically has a thickness
ranging from about 3 ? to about 1,000 ?, wherein
precursor materials used to deposit the protective thin
film are organic-based precursors which include at least
one fluorine-comprising functional group at one end of a
carbon back bone and at least one functional bonding
group at the opposite end of a carbon backbone, and
wherein the carbon backbone ranges in length from 4
carbons through about 12 carbons. In many
applications at least a portion of the protective thin film
is removed during fabrication of the devices.
Type: Grant
Filed: June 5, 2006
Issued: November 29, 2011
Inventors: Jeffrey D. Chinn, Boris Kobrin, Romuald
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3 of 12 11/27/14, 12:23 PM

Nowak
Controlled vapor deposition of multilayered coatings
adhered by an oxide layer
Abstract: An improved vapor-phase deposition method
and apparatus for the application of multilayered
films/coatings on substrates is described. The method
is used to deposit multilayered coatings where the
thickness of an oxide-based layer in direct contact with
a substrate is controlled as a function of the chemical
composition of the substrate, whereby a subsequently
deposited layer bonds better to the oxide-based layer.
The improved method is used to deposit multilayered
coatings where an oxide-based layer is deposited
directly over a substrate and an organic-based layer is
directly deposited over the oxide-based layer. Typically,
a series of alternating layers of oxide-based layer and
organic-based layer are applied.
Type: Grant
Filed: July 29, 2010
Issued: October 1, 2013
Nowak, Richard C. Yi
Controlled vapor deposition of multilayered coatings
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directly over a substrate and an organic-based layer is
directly deposited over the oxide-based layer. Typically,
a series of alternating layers of oxide-based layer and
organic-based layer are applied.
Type: Grant
Filed: April 21, 2005
Issued: August 17, 2010
Method of depositing a multilayer coating with a
variety of oxide adhesion layers and organic layers
directly over a substrate and a SAM organic-based layer
is directly deposited over the oxide-based layer.
Typically a series of alternating layers of oxide-based
layer and organic-based layer are applied.
Type: Grant
Filed: November 4, 2010
Issued: October 30, 2012
Assignee: Applied MicroStructures, Inc.
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MOISTURE BARRIER COATINGS
Abstract: A moisture barrier coating for protecting a
substrate from moisture, comprises an inorganic layer
disposed over the substrate, the inorganic layer
comprising an oxide or nitride of an element selected
from the group consisting of silicon, aluminum, titanium,
zirconium, hafnium and combinations thereof; and an
organic silicon-containing layer disposed over the
inorganic layer.
Type: Application
Filed: August 5, 2013
Issued: December 5, 2013
Inventors: Boris Kobrin, Nikunj Hirji Dangaria, Romuald
Nowak, Michael T. Grimes
Articles with super-hydrophobic and-or super-hydrophilic
surfaces and method of formation
Abstract: The present invention is related to a chemical
vapor deposition method of depositing layers of
materials to provide super-hydrophilic surface
properties, or super-hydrophobic surface properties, or
combinations of such properties at various locations on
a given surface. The invention also relates to electronic
applications which make use of super-hydrophobic
surface properties, and to biological applications which
make use of super-hydrophilic surface properties.
Type: Grant
Filed: September 26, 2007
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Inventors: Boris Kobrin, Jeffrey D. Chin, Benigno A.
Janeiro, Romuald Nowak
DURABLE, HEAT-RESISTANT MULTI-LAYER
COATINGS AND COATED ARTICLES
Abstract: An article having a surface treated to provide
a protective coating structure in accordance with the
following method: vapor depositing a first layer on a
substrate, wherein said first layer is a metal oxide
adhesion layer selected from the group consisting of an
oxide of a Group IIIA metal element, a Group IVB metal
element, a Group VB metal element, and combinations
thereof; vapor depositing a second layer upon said first
layer, wherein said second layer includes a silicon-containing
layer selected from the group consisting of
silicon oxide, silicon nitride, and silicon oxynitride; and
vapor depositing a third layer upon said second layer,
wherein said third layer is a functional organic-comprising
layer, wherein said functional organic-comprising
layer is a SAM.
Type: Application
Filed: August 5, 2013
Inventors: Boris Kobrin, Nikunj Dangaria, Romuald
Method of in-line purification of CVD reactive
precursor materials
Abstract: We have devised an apparatus useful for and
a method of removing impurities from vaporous
precursor compositions used to generate reactive
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precursor vapors from which thin films/layers are
formed under sub-atmospheric conditions. The method
is particularly useful when the layer deposition
apparatus provides for precise addition of quantities of
different combinations of reactants during a single step
or when there are a number of different individual steps
in the layer formation process, where the presence of
impurities has a significant affect on both the quantity of
reactants being charged and the overall composition of
the reactant mixture from which the layer is deposited.
The method is particularly useful when the vapor
pressure of a liquid reactive precursor is less than about
250 Torr at atmospheric pressure.
Type: Grant
Filed: September 20, 2007
Issued: March 30, 2010
Inventors: Boris Kobrin, Romuald Nowak, Jeffrey D.
Chinn, Richard C. Yi
Method for controlled application of reactive vapors
to produce thin films and coatings
Abstract: A vapor phase deposition method and
apparatus for the application of thin layers and coatings
on substrates. The method and apparatus are useful in
the fabrication of electronic devices, micro-electromechanical
systems (MEMS), Bio-MEMS
devices, micro and nano imprinting lithography, and
microfluidic devices. The apparatus used to carry out
the method provides for the addition of a precise
amount of each of the reactants to be consumed in a
single reaction step of the coating formation process.
The apparatus provides for precise addition of
quantities of different combinations of reactants during
a single step or when there are a number of different
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individual steps in the coating formation process. The
precise addition of each of the reactants in vapor form
is metered into a predetermined set volume at a
specified temperature to a specified pressure, to
provide a highly accurate amount of reactant.
Type: Grant
Inventors: Boris Kobrin, Romuald Nowak, Richard C.
Yi, Jeffrey D. Chinn
Durable, heat-resistant multi-layer coatings and
coated articles
Abstract: A method of providing a durable protective
coating structure which comprises at least three layers,
and which is stable at temperatures in excess of 400°
C., where the method includes vapor depositing a first
layer deposited on a substrate, wherein the first layer is
a metal oxide adhesion layer selected from the group
consisting of an oxide of a Group IIIA metal element, a
Group IVB metal element, a Group VB metal element,
and combinations thereof; vapor depositing a second
layer upon said first layer, wherein said second layer
includes a silicon-containing layer selected from the
group consisting of silicon oxide, silicon nitride, and
silicon oxynitride; and vapor depositing a third layer
upon said second layer, wherein said third layer is a
functional organic-comprising layer. Numerous articles
useful in electronics, MEMS, nanoimprinting lithography,
and biotechnology applications can be fabricated using
the method.
Type: Grant
Filed: May 5, 2008
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Inventors: Boris Kobrin, Dangaria Nikunji Hirji, Romuald
Controlled deposition of silicon-containing coatings
films/coatings on substrates. The method provides for
the addition of a precise amount of each of the
reactants to be consumed in a single reaction step of
the coating formation process. In addition to the control
over the amount of reactants added to the process
chamber, the present invention requires precise control
over the total pressure (which is less than atmospheric
pressure) in the process chamber, the partial vapor
pressure of each vaporous component present in the
process chamber, the substrate temperature, and
typically the temperature of a major processing surface
within said process chamber. Control over this
combination of variables determines a number of the
characteristics of a film/coating or multi-layered
film/coating formed using the method. By varying these
process parameters, the roughness and the thickness of
the films/coatings produced can be controlled.
Type: Grant
Filed: November 19, 2009
Issued: May 15, 2012
Controlled deposition of silicon-containing coatings
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films/coatings on substrates. The method provides for
the addition of a precise amount of each of the
reactants to be consumed in a single reaction step of
the coating formation process. In addition to the control
over the amount of reactants added to the process
chamber, the present invention requires precise control
over the total pressure (which is less than atmospheric
pressure) in the process chamber, the partial vapor
pressure of each vaporous component present in the
process chamber, the substrate temperature, and
typically the temperature of a major processing surface
within said process chamber. Control over this
combination of variables determines a number of the
characteristics of a film/coating or multi-layered
film/coating formed using the method. By varying these
process parameters, the roughness and the thickness of
the films/coatings produced can be controlled.
Type: Grant
Filed: June 4, 2004
High aspect ratio performance coatings for
biological microfluidics
biotechnologically functional devices, Bio-MEMS
devices, and in the fabrication of microfluidic devices
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for biological applications. In one important
embodiment, oxide coatings providing hydrophilicity or
oxide/polyethylene glycol coatings providing
hydrophilicity can be deposited by the present method,
over the interior surfaces of small wells in a plastic
micro-plate in order to increase the hydrophilicity of
these wells. Filling these channels with a precise
amount of liquid consistently can be very difficult. This
prevents a water-based sample from beading up and
creating bubbles, so that well can fill accurately and
completely, and alleviates spillage into other wells which
causes contamination.
Type: Grant
Filed: January 31, 2005
Issued: February 1, 2011
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