Technology of cleaning and destruction of a surface of semiconductor plates using highly concentrated ozone

1. Research &
Development
Solway
Open company «Solway» was created in 2011 by Russian
specialists in the field of electrochemistry and physico-
chemical engineering in Moscow. The company works to
develop high technology devices in engineering science
for magnification of knowledge and its implementation
in practice.
Technology of cleaning and destruction
of a surface of semiconductor
plates using highly concentrated ozone

2. Problems
Today there are many problems of cleaning of a surface of semiconductors:
technically complex and expensive equipment with high power consumption;
significant time required for cleaning and structuring a surface;
the use of expensive, toxic and hazardous chemicals (surfactants, alkalis, acids);
10% of marriage of plates after are sharp also cleanings of a surface.
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3. Demand / market
Leading producers of semiconductors
Intel
Samsung
Qualcomm
TSMC
Toshiba
Nvidia
MediaTek + MStar
STMicroelectronics
Broadcom
Micron Technology
USA
South Korea
USA
Taiwan
Japan
USA
Taiwan
Switzerland
USA
USA
51,400
37,810
19,291
24,976
11,040
4,348
7,032
7,384
8,427
16,814
Сompany Headquarters Sales
($bn)
11,537
2,965
5,501
1,874
1,820
1,362
1,430
1,520
2,373
1,430
R&D Exp
($bn)
22,4%
7,8%
28,5%
7,5%
16,5%
31,3%
20,3%
20,6%
28,2%
8,5%
R&D/Sales
(%)

4. Demand / market
0,5%
The volume of all market
(PAM)
Volume of the target market
(TAM)
Volume it is realistic
an achievable segment
(SAM)
Market size in the world
400 bn $
90 bn $
30 bn $
150 m $
Market of the equipment
of cleaning of a surface
of semiconductor plates
Annually producers of semiconductors
spend for the equipment
of cleaning and new technologies
Volume it is realistic an achievable
share of the market (in a year)

5. Manufacturers
Leading suppliers of the equipment for semiconductor productions
Сompany Headquarters Market share
Applied Materials USA 15,0 %
Tokyo Electron Japan 11,9%
ASML Netherlands 10,2%
KLA-Tencor Corp. USA 5,1%
Lam Research USA 5,0%
Nikon Japan 4,0%
Advantest Japan 3,6%
Novellus Systems USA 2,7%
Dainippon Screen Japan 2,6%
ASM International Netherlands 2,3%

6. Solution
highly efficient, environmentally friendly and safe for semiconductor cleaning from
the organic, metal contaminants and removing thephotoresist.;
the price is one equipment lower, in comparison with the applied analogs;
use of the high concentration ozone more 200mg/L;
chemicals are used ТОС=0, with possible regeneration of the fulfilled solutions for
the purpose of repeated use and utilization of without additional processing;
reduction of the rejected semiconductor plates for 80% аnd reduction of costs of
production of the final product.
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7. Oxidizer
Fluorine
Hydroxyl (ОН-)
Oxygen atom
Ozone
Hydrogen peroxide
Hypochlorous acid
Chlorine
Oxidizing potential, V
3,06
2,80
2,42
2,07
1,77
1,49
1,36
Ozone
Ozone is natural gaseous substance, it often is present at environment. The ozone layer protects
our planet from the ultra-violet sunlight. Ozone can be created in low concentration at
thunderstorm or under bright sun in summer. It is often thought be an air pollutant, but this is
incorrect.
Ozone is an effective pollution-free oxidizing agent. Especially valuable feature of ozone is that
after its disintegration no undesirable substances remain in environment, the only product is
oxygen. Ozone is very strong oxidizing agent. From stable substances only fluorine is stronger,
chlorine is much less active.

8. Drinking water
Areas of application of ozone
Flocculation improving
Decrease in a chromacity, smack and odour
Fe/Mn oxidation
Disinfection
Decreasing of total organic carbon
(for example, trihalidemethane)
Destruction of the substances
influencing endocrine system
Semiconductor
production
Disinfection
Destruction of metal pollution
Removing of photoresist
Morphology of surface
Waste water
Decreasing of chemical oxygen demand
Bleaching
Destruction of tensids
Destruction of phenols
Sludge treatment
Destruction of carbamide and nitrates
Destruction of adsorbed halogenorganics
Destruction of substances
influencing endocrine system
Decontamination of oil products
Destruction of toxic organic compounds
Resoiling
MTBE (methyl thretyl butyl ethyl)
Cleaning from trichloroethylene
Cleaning from pesticides
Cleaning from aromatics
Cleaning from carbon hydrogens
Cleaning from oil products
Cleaning from volatile hydrocarbons
Cleaning from benzene, toluene,
ethyl benzene, xylene
Technical water
Treatment of water for cooling
(for example, on power stations)
Water treatment for swimming pools
Treatment of rinsing water
at the factories for drink production
Food industry
Disinfection of water, sugar syrup, saft, etc.
Removing of Fe and Mn from raw water
Cleaning in situ
Washing and disinfection

9. Areas of application of ozone
Purification
and treatment
of production
Viscosity improvement (for example, starch)
Magnification of shelf life of foodstuff
(for example, salad-latuka)
Machining of surfaces
(for example, lamination, drawing of coats)
Pharmaceutics
and cosmetology
Cleaning of raw water
Treatment of purified and deionized water
Removing of organic carbon
Cleaning of industrial waste water
Deactivation of a liquid radioactive wastesBleaching
Potching cellulose (pulp and paper industry)
Porcelain clay (china-clay)
Processing LRW
Ozonolysis/
synthesis
Deodoration
New products synthesis
Modification of products
Oxidation of H2S (waste gases)
Mercaptans
Sediment
treatment
Sediment decreasing
Optimized reliable cleaning
at sewage water treatment plants
Cleaning of bottom sediment from oil products

10. Substances which can be
oxidized by ozone
Adsorbable organic hydrogens
NO2 (Nitrite)
Fe (Iron)
Mn (Manganese)
CN (Cyanide)
Compounds for protection of agricultural crops (pesticides)
EDTA (Versenate)
NOx (Nitric oxides)
H2S (Hydrogen sulphide, other odorous materials)
Chlorine-containing hydrocarbons
PAH (Polycyclic aromatic hydrocarbons)
Colouring agents
Medical products, compounds which destroy incretory activity

11. Energy consumption of electrolyzer – 0.2 kWh;
Total energy consumption, - less than 1 kW (cooling system, pumps and the management block);
Power supplies are carried out from source U = 12 V that allows to operate electrolyzer in the «field» conditions, e.g. applying
solar batteries or wind power without use of inverted rectifiers providing save of energy, eliminating loss in transformers
from industrial current sources 220/110 V;
Produced oxygen-ozone intermixture is of high purity. In the UV-spectrum the only one absorption band at λ = 240-255 nm
(Hartley ozone band), was observed.
This installation is of small sizes - less than 1/8 м3.
For operation of this installation the integral cooling system which works on Pelte elements of high ecological compatibility is
created. This system, however, is insufficiently effective on power consumption and it can be exchanged with the traditional.
Installation for 10 liters/hour
of ozone-oxygen mixture generation
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12. The proposed technology relates to the production of semiconductor devices, in particular for cleaning the
surface of silicon from metal, organic contaminants and removing the photoresist. The technology applies the
process of regeneration of spent pickling solution for its subsequent return to production, without additional
costs for chemicals and electricity. Technology it can find application in microelectronics, radio, electrical and
other industries. The essence of the technology is to clean the surface of a semiconductor wafers:
Fluid purification. Wafer is placed in a bath of cleaning solution (TOC = 0) activated by continuously injected
into the flow the ozone-oxygen mixture with ozone concentration about 23% by volume and ultrasound
impact at room temperature (20-25 C) followed by rinsing in deionized water. Application of the proposed
method does not require frequent adjustments of the composition of the solution to the complete destructive
oxidation of organics (photoresist film) to complete mineralization (H2O and CO2).
Dry purification. Wafer is placed in a chamber and treated with a continuous stream of ozone-oxygen mixture
with the ozone concentration more than 23% by volume. Thus oxidative degradation processes occur
photoresist polymer film to complete mineralization and formation of oxide coatings.
The technology enables the creation of highly efficient, resource - saving, environmentally friendly and safe
way of cleaning the surface of semiconductor wafer from organic, metal contamination and removal of the
photoresist. It significantly reduces the time of processing (less than 1 minute; depending on the degree of
contamination orthickness of photoresist, depending on the type - 1-5 minutes). The developed technology
has been tested in the industrial company Kvazar and received highly positive reviews.
Тechnology

13. Business model
Contractors
Assembly
and testing
Channels of sales
Licensing

14. Current status
Idea
2011 2012-2014 2015-2016
creation
of a laboratory
sample
patent
application
the certificate
is received
creation
of a prototype
installation
of a prototype
development
of a laboratory sample
approbation
of technology
take
out a patent
Investments
on a prototype
negotiations
with the enterprises
entry into
the market
2017

15. Key project team members
Leadership, project coordi-
nation, sales. Development
and implementation of pro-
jects. Cooperation in the
field of microelectronics,
solar energy in Canada,
England, Germany, Techni-
cal University of Chemnitz.
Maxim Zarezov
Experience in the micro-
electronics, solar energy,
energy systems. Coopera-
tion in the field of micro-
electronics, solar energy
systems in Canada, Eng-
land, Germany, Cyprus,
Switzerland, Ukraine.
Anton Mantuzov
The development and
industrial implementation
of innovative technological
solutions and electronic
materials. Оrder, import of
advanced technological
equipment. Cooperation in
the field of microelectron-
ics and solar energy in
Canada, England, Germany,
Technical University of
Chemnitz.
Victor Mantuzov
The implementation of
scientific management of
semiconductor structures
formation and decontami-
nation by highly concen-
trated ozone and magnetic
field. Dr. Sci., Physics and
Mathematics. Cooperation
in the areas of water trea-
ment in Germany.
Dr. Sci., Physics and Math-
ematics.
Vladimir Klochikhin

16. Contacts
Maxim Zarezov CEO
+ 7 (903) 668-6516
Anton Mantuzov Deputy Director
+ 7 (909) 150-5703
E-mail: solway.npp@gmail.com