this shows how the thin films are related to our day to day life this helps u while taking seminar

1. LET ME BEGIN MY SEMINAR
NOW

2. WE ARE GOING TO KNOW SOMETHING ABOUT ?

3. THIN FILMS

4. WHAT IS A THIN FILM ?
• A thin film is a layer of material
ranging from fractions of
a nanometer (monolayer) to
several micrometers in thickness.

5. CLASSIFICATION OF THIN FILMS
(a) single crystals
(b) epitaxial
(c) polycrystalline
(d) amorphous.

6. PROPERTIES OF THIN FILMS
(a) High surface to volume ratio
(b) Geometrical control (dictated by
substrate)
(c) Compact
(d) Single crystal like properties

7. USES OF THIN FILMS
 Microelectronic devices
 Telecommunication devices
 Decorative coatings
 Optical coatings (windows,
solar cells, etc.)
 Sensors
 Catalysts

10. LIQUID PHASE DEPOSITION PROCESS, LPD)

11. SEM IMAGES OF THE DEPOSITED H-FEOOH FILMS AT VARIOUS
CONCENTRATIONS. CONCENTRATION OF H3BO3:
(A) 0.30, (B) 0.40, (C) 0.45, (D) 0.50, (E) 0.55, AND (F) 0.60 MOL DM-3.

12. CHEMICAL BATH DEPOSITION (CBD)

13. SOME PRINCIPLES INVOLVED
• while the water itself provides oxygen, initially in the form of
OH- ions.
• Hydrolysis can occur even in acidic solutions when the metal
cation is easily hydrolysable,
as with Fe3+ , Ti4+ , Zr4+ , and Al3+
• CBD requires supersaturated solutions, i.e. the
concentrations must exceed the solubility product
• In a closed system, growth cannot continue once the
reactants have been depleted below this point, which
determines the thickness of the film

14. CHEMICAL VAPOR DEPOSITION
Involves one or more gas phase species which react on
a solid surface (substrate) to deposit a solid film.
Typically, the reaction is initiated by heating the
substrate. Other mechanisms of supplying the
activation energy necessary to initiate reactions include:
laser CVD, photo CVD, and plasma enhanced CVD.

15. DISADVANTAGES
• High operating temperatures
• Toxic Gases
• Generally applicable to binary and
elemental films
• Not suitable for production of
metastable products

16. ADVANTAGES
• High deposition rates
• Capable of accurate stoichiometry
control
• High quality films (low defect
concentration)
• No need for high vacuum components
• Favored in industrial settings

17. REQUIREMENTS FOR PRECURSOR
• High Purity (No unwanted doping)
• Good Vapor Pressure
• Stability
• Clean Decomposition on Surface

18. DO YOU KNOW ?

19. HOW THE THIN FILMS ARE PRESENT IN OUR DAY 2 DAY LIFE ?

20. THIN FILMS & YOU

21. Thank you

22. 