MEMS, Etching, Ab Initio and Monte Carlo based simulation

1. IntelliEtch
Atomistic Etch Simulator

2. IntelliEtch
Validated simulator Speed
Detailed experimental backing Fast simulation speed. Results in 5-30
minutes depending upon resolution
Ab initio effects
First principle based etcher, includes Export to FEA
effects of steric interaction, backbond Direct export to IntelliSuite tools
weakening, impurity micromasking
Validated database
Composite processing Database for etching based upon pioneering
Effects of multi-masking, multiple work of Dr Sato at U Nagoya
process steps

3. Experimental validation
Etched Silicon Sphere Etch Results Simulation Results
Dr. Sato et al, U Nagoya Japan