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PUNYASHLOK AHILYADEVI HOLKAR SOLAPUR
UNIVERSITY, SOLAPUR
Presentation on
“Synthesis of Manganese Sulphide Electrode by
Electrodeposition and its supercapacitive characterization”
submitted to
school of physical sciences
Physics Department
Energy studies(2022-2023)
under the guidance of
Prof.Dr.V.B.Patil
Presented by: Miss Arvatkal .D.S , Miss Kulkarni.A.J ,
Miss Lavate.S.L
Index
a) Introduction.
b) Difference between capacitor and supercapacitor.
c) Applications of supercapacitor.
d) Method of thin film deposition.
e) Electrodeposition method.
f) Manganese Sulphide.
g) Characterization of deposited thin films.
i) X –ray diffraction (XRD)
ii)Cyclic voltammentry
iii)Galvanostatic charge /Discharge(GCD)
h)Result & conclusion
i)References
INTRODUCTION
Supercapacitors are new type of energy storage device
and are undergoing development since years.
Supercapacitors can be defined as a energy storage
device that stores energy electrostatically by polarizing
an electrolytic solution.
A supercapacitor also called an ultracapacitor.
Supercapacitors are electrochemical devices with
following features:
a.High energy density b.High power density
c.High capacitance d. longer cyclic life
Difference between Capacitor
and Supercapacitor
Supercapacitor
• A supercapacitor
has high
capacitance and
low voltage.
• A seperator is
used electrolyte.
 Capacitor
• A capacitor has low
capacitance value
and high voltage.
• Here, in capacitor
dielectric materials
are used.
Applications
• In starting mechanism for automobiles.
• Supercapacitor are suitable temporary energy storage device.
• Power source for laptops ,flash in cameras.
• Voltage stabilizer.
 Method of Thin Film Deposition
There are various methods for the deposition of thin film.
There are following two techniques,
A.Physical Techniques
B.Chemical Techniques
Chemical Techniques
• Some technique are discussed below
a. Anodisation b. Chemical vapour deposition
c.electrodeposition d. SILAR
• Chemical methods are relatively economical and are easier as
compared to physical method.
• From these methods electrodeposition seems more preferred.
Why Electrodeposition?
• It is simple, easy and inexpensive method
• The growth rate can easily controlled through electrical
quantity such as current density and deposition potential.
• It is mostly popular because of its low cost and good quality of
deposition.
Experimental Setup
• DC power supply
Graphite
rod
Substrate
+
-
Figure 1: Experimental Setup
Advantages And Disadvantages
Advantages
1. Decorations- shine and
luster can be imported
for other dull surface.
2. Corrosion resistance- A
corrosion prone
substance such as iron
can be coated with
non corrosive material.
3. It has relatively low
cost.
Disadvantages
1. Environmental impact-
The solution needs to
be disposed safely as it
cause environmental
concern.
2.Non –uniform
deposition it may be
or may not be uniform
sometimes
Parameters of Electrodeposition
a) Operating voltage.
b) Solution concentration.
c) Current Density.
d) The nature of the anions or cations in the solutions.
e) Nature of substrate surface.
Managanese sulphide
• At present supercapacitors are the most promising form of
high capacity mobile energy storage device.
• Manganese based has great importance because of its cost
efficient simple fabrication.
• Manganese Sulphide based supercapacitor shows structural
flexibility.
Procedure
Stainless steel substrates were
polished and ultrasonicated for 15 min.
Manganese (II) acetate (0.1 M) +
Thiourea (0.1M) +50ml distilled water
+ stirring (10min)
Electrodeposition was carried out at
1.8V for 60 min + film annealing at
300 0 C at 60 min.
X-Ray Diffraction
 JCPDS No. 40-1289
 XRD pattern
confirms cubic
structure of
Managanese
Sulphide
Figure 2: XRD pattern
Cyclic Voltammetry
Figure 3: CV curves in 1M KOH
Cs = 768 F/g
Galvanostatic Charge Discharge
Cs = 116 F/g
E = 13.05 Wh/Kg
P = E/td = 870 W/Kg
Conclusion
• Manganese sulphide have been prepared successfully
• The XRD pattern conforms the cubic structure of manganese
sulphide respectively
Reference
• Anuar k, Ho SM. Deposition and characcterization of MnS thin
film by chemical bath deposition method . International
journal of chemistry research 2010.
• Gong J; zana I ; Zangari G. electrochemical synthesis of
crystalline and amorphous manganese coating J.
Mater.sci.lee.2001,.
msc project.pdf

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msc project.pdf

  • 1. PUNYASHLOK AHILYADEVI HOLKAR SOLAPUR UNIVERSITY, SOLAPUR Presentation on “Synthesis of Manganese Sulphide Electrode by Electrodeposition and its supercapacitive characterization” submitted to school of physical sciences Physics Department Energy studies(2022-2023) under the guidance of Prof.Dr.V.B.Patil Presented by: Miss Arvatkal .D.S , Miss Kulkarni.A.J , Miss Lavate.S.L
  • 2.
  • 3. Index a) Introduction. b) Difference between capacitor and supercapacitor. c) Applications of supercapacitor. d) Method of thin film deposition. e) Electrodeposition method. f) Manganese Sulphide. g) Characterization of deposited thin films. i) X –ray diffraction (XRD) ii)Cyclic voltammentry iii)Galvanostatic charge /Discharge(GCD) h)Result & conclusion i)References
  • 4. INTRODUCTION Supercapacitors are new type of energy storage device and are undergoing development since years. Supercapacitors can be defined as a energy storage device that stores energy electrostatically by polarizing an electrolytic solution. A supercapacitor also called an ultracapacitor. Supercapacitors are electrochemical devices with following features: a.High energy density b.High power density c.High capacitance d. longer cyclic life
  • 5. Difference between Capacitor and Supercapacitor Supercapacitor • A supercapacitor has high capacitance and low voltage. • A seperator is used electrolyte.  Capacitor • A capacitor has low capacitance value and high voltage. • Here, in capacitor dielectric materials are used.
  • 6. Applications • In starting mechanism for automobiles. • Supercapacitor are suitable temporary energy storage device. • Power source for laptops ,flash in cameras. • Voltage stabilizer.
  • 7.  Method of Thin Film Deposition There are various methods for the deposition of thin film. There are following two techniques, A.Physical Techniques B.Chemical Techniques
  • 8. Chemical Techniques • Some technique are discussed below a. Anodisation b. Chemical vapour deposition c.electrodeposition d. SILAR • Chemical methods are relatively economical and are easier as compared to physical method. • From these methods electrodeposition seems more preferred.
  • 9. Why Electrodeposition? • It is simple, easy and inexpensive method • The growth rate can easily controlled through electrical quantity such as current density and deposition potential. • It is mostly popular because of its low cost and good quality of deposition.
  • 10. Experimental Setup • DC power supply Graphite rod Substrate + - Figure 1: Experimental Setup
  • 11. Advantages And Disadvantages Advantages 1. Decorations- shine and luster can be imported for other dull surface. 2. Corrosion resistance- A corrosion prone substance such as iron can be coated with non corrosive material. 3. It has relatively low cost. Disadvantages 1. Environmental impact- The solution needs to be disposed safely as it cause environmental concern. 2.Non –uniform deposition it may be or may not be uniform sometimes
  • 12. Parameters of Electrodeposition a) Operating voltage. b) Solution concentration. c) Current Density. d) The nature of the anions or cations in the solutions. e) Nature of substrate surface.
  • 13. Managanese sulphide • At present supercapacitors are the most promising form of high capacity mobile energy storage device. • Manganese based has great importance because of its cost efficient simple fabrication. • Manganese Sulphide based supercapacitor shows structural flexibility.
  • 14. Procedure Stainless steel substrates were polished and ultrasonicated for 15 min. Manganese (II) acetate (0.1 M) + Thiourea (0.1M) +50ml distilled water + stirring (10min) Electrodeposition was carried out at 1.8V for 60 min + film annealing at 300 0 C at 60 min.
  • 15. X-Ray Diffraction  JCPDS No. 40-1289  XRD pattern confirms cubic structure of Managanese Sulphide Figure 2: XRD pattern
  • 16. Cyclic Voltammetry Figure 3: CV curves in 1M KOH Cs = 768 F/g
  • 17. Galvanostatic Charge Discharge Cs = 116 F/g E = 13.05 Wh/Kg P = E/td = 870 W/Kg
  • 18. Conclusion • Manganese sulphide have been prepared successfully • The XRD pattern conforms the cubic structure of manganese sulphide respectively
  • 19. Reference • Anuar k, Ho SM. Deposition and characcterization of MnS thin film by chemical bath deposition method . International journal of chemistry research 2010. • Gong J; zana I ; Zangari G. electrochemical synthesis of crystalline and amorphous manganese coating J. Mater.sci.lee.2001,.