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GOING 3-D: SAME EQUIPMENT, DIFFERENT STEPS
HOW 2-D CHIPS ARE MADE
           1                          2                       3                         4                        5




         Patterns of ultraviolet    Exposed photoresist     Ions are showered onto    The wafer is coated      Chemical-mechanical
         light are focused onto     is removed, and         the wafer, doping areas   with insulating          polishing flattens the
         a silicon wafer coated     unprotected areas are   of exposed silicon to     dielectric or            wafer’s surface with
         with photoresist           etched away by gases    make transistors          conducting metal         50-nanometer precision

                        PROCESS IS REPEATED FOUR OR MORE TIMES TO ADD METAL INTERCONNECTIONS AND INSULATING OXIDES


HOW 3-D CHIPS ARE MADE
Additional steps using the same equipment and materials create 3-D microcircuits with many polysilicon transistors stacked vertically


     1    2                                                                                          RETICLE (MASK)

                                                                                                     LENS



         Photolithography                                                                                                      Photoresist
         and etching proceed                                                                                                   Silicon
         just as for 2-D chips,                                                                                                dioxide
         above                                                                                                                 Silicon
                                                                                                                               nitride
                                                                                                                               Silicon
                                                                                                                               substrate
          3                                          PREPARED SILICON
                                                          WAFER




         Ion implantation
         dopes the silicon
         to create
         transistors


           4                         5                        6                         7                        8




         Three new layers are      Photolithography is      Memory cells and          Chemical-mechanical     A layer of “antifuse”
         added: polysilicon,       repeated to create       metal interconnections    polishing knocks down   material is added; burning
         tungsten metal and        active regions of        are etched; insulation    any high spots          out an antifuse will store
         then more polysilicon     polysilicon              is added                                          a bit in the memory

                              PROCESS IS REPEATED NINE TIMES TO STACK EIGHT MEMORY CELLS ON TOP OF ONE ANOTHER

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3dchips

  • 1. GOING 3-D: SAME EQUIPMENT, DIFFERENT STEPS HOW 2-D CHIPS ARE MADE 1 2 3 4 5 Patterns of ultraviolet Exposed photoresist Ions are showered onto The wafer is coated Chemical-mechanical light are focused onto is removed, and the wafer, doping areas with insulating polishing flattens the a silicon wafer coated unprotected areas are of exposed silicon to dielectric or wafer’s surface with with photoresist etched away by gases make transistors conducting metal 50-nanometer precision PROCESS IS REPEATED FOUR OR MORE TIMES TO ADD METAL INTERCONNECTIONS AND INSULATING OXIDES HOW 3-D CHIPS ARE MADE Additional steps using the same equipment and materials create 3-D microcircuits with many polysilicon transistors stacked vertically 1 2 RETICLE (MASK) LENS Photolithography Photoresist and etching proceed Silicon just as for 2-D chips, dioxide above Silicon nitride Silicon substrate 3 PREPARED SILICON WAFER Ion implantation dopes the silicon to create transistors 4 5 6 7 8 Three new layers are Photolithography is Memory cells and Chemical-mechanical A layer of “antifuse” added: polysilicon, repeated to create metal interconnections polishing knocks down material is added; burning tungsten metal and active regions of are etched; insulation any high spots out an antifuse will store then more polysilicon polysilicon is added a bit in the memory PROCESS IS REPEATED NINE TIMES TO STACK EIGHT MEMORY CELLS ON TOP OF ONE ANOTHER