This document examines the crystalline structure of pre-cast photoresist film using electron microscopy. It describes how the film sample was prepared by etching it with sodium hydroxide solution to dissolve the more soluble components and leave behind less soluble vertical cylinders. Scanning electron microscopy revealed the dry film is polycrystalline and consists of lamellae that slide over each other during thermal stress, indicating the forces between lamellae are weaker than those between vertically oriented polymer molecules. The document proposes a mechanism for the ordered structure observed in the pre-cast photoresist film.

1. Examining
Crystalline
Structure
of
Pre-­‐Cast
Photoresist
Film
Electron microscopy in Field Emission Mode!
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2. First
Layer
or
Lamella
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3. Second
Layer
or
Lamella
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4. PREPARATION
OF
SAMPLE
• Pre-­‐cast
photoresist
dry
film
is
etched
with
10%
w/v
NaOH
causing
more
soluble
component
to
dissolve,
leaving
behind
less
soluble
component
appearing
as
verMcal
cylinders.
• SeparaMon
of
film
is
arMfact
cause
by
heat
transfer
of
electron
beam.

5. CLEAVAGE
MECHANISM
BETWEEN
LAMELLAE
DURING
STRIPPING
• SEM’s
reveal
that
the
dry
film
is
polycrystalline
and
that
lamellae
slide
over
each
other
during
thermal
stress.
• This
implies
the
forces
between
lamellae
are
weaker
than
the
forces
between
the
verMcally
oriented
polymer
molecules.

6. Proposed
Mechanism
for
Ordered
Structure
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