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Abdalla Darwish   Dillard University, Physics and Engineering Department, New Orleans, LA 70122 Laser Matter Research Lab , Kenner, LA 70065 University of New Orleans, New Orleans, LA 70122
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1.The target material is ablated by a KrF excimer laser or Nd:YAG laser. 2. The ejected material forms a plasma plume and expands across to the substrate where it is deposited as a film. 3. The substrate is heated by a raster-scanned CO 2  laser. 4. A background gas is used to control the plume stoichiometry and dynamics.
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Some defects on the thin film due to PLD process
SEM of the thin film with 100 mJ and 150 mJ energy pulse before using the thin film
SEM of the thin film after 10 hours and 30 hours  of usages
X-section of the thin film
 
Laser in  The optical sensor Beam expander Acoustic wave Beam collector Beam expander
Diffraction pattern without acoustic wave, T=85 F Diffraction pattern with acoustic wave, T= 85F Diffraction pattern with acoustic wave T=65 F Diffraction pattern with acoustic wave , T=40  F
Diffraction pattern with acoustic wave , T=105 F
 
Diffraction pattern with acoustic wave  after 65 hours of usages  and exposure to many different temperature over the period of one year
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Pulse laser depostion of thin film

  • 1. Abdalla Darwish   Dillard University, Physics and Engineering Department, New Orleans, LA 70122 Laser Matter Research Lab , Kenner, LA 70065 University of New Orleans, New Orleans, LA 70122
  • 2.
  • 3.
  • 4.
  • 5.  
  • 6. 1.The target material is ablated by a KrF excimer laser or Nd:YAG laser. 2. The ejected material forms a plasma plume and expands across to the substrate where it is deposited as a film. 3. The substrate is heated by a raster-scanned CO 2 laser. 4. A background gas is used to control the plume stoichiometry and dynamics.
  • 7.
  • 8.
  • 9.  
  • 10.  
  • 11.  
  • 12.  
  • 13.  
  • 14.  
  • 15.  
  • 16.  
  • 17.
  • 18.
  • 19. Some defects on the thin film due to PLD process
  • 20. SEM of the thin film with 100 mJ and 150 mJ energy pulse before using the thin film
  • 21. SEM of the thin film after 10 hours and 30 hours of usages
  • 22. X-section of the thin film
  • 23.  
  • 24. Laser in The optical sensor Beam expander Acoustic wave Beam collector Beam expander
  • 25. Diffraction pattern without acoustic wave, T=85 F Diffraction pattern with acoustic wave, T= 85F Diffraction pattern with acoustic wave T=65 F Diffraction pattern with acoustic wave , T=40 F
  • 26. Diffraction pattern with acoustic wave , T=105 F
  • 27.  
  • 28. Diffraction pattern with acoustic wave after 65 hours of usages and exposure to many different temperature over the period of one year
  • 29.
  • 30.
  • 31.  
  • 32.
  • 33.
  • 34.