Perkin elmer series 4400 and 2400 sputter deposition systems
Perkin elmer-2400-8sa-manua
1. Perkin Elmer Manual Sputter Deposition System- Perkin-Elmer 2400-8sa Page 1 of 5
20 Years Proven True
"Work Horse" Sputter
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8SA | Perkin-Elmer 2400-8L
Sputtering Equipment Perkin-Elmer 2400-8SA Sputtering Systems
AccuSputter AW 4450 - Brand New
We have been focusing on providing solutions and
Perkin-Elmer 4480 enhancements to Perkin-Elmer Sputtering Systems including
Perkin-Elmer PE 4400, PE 4410, PE 4450, PE 4480, PE
Perkin-ELmer 4450
2400 Series. These OEM Sputter Coating systems have
been used in production and R&D since 1980"s and 1990's.
They have been proven to be a true "work horse".
Perkin-ELmer 4410
Please contact us by e-mail ( sales@perkin-elmer-
Perkin-ELmer 4400 sputter.com ) to check whether the fully refurbished and
upgraded Perkin-ELmer PE 2400 8SA Sputter Deposition is
Perkin-ELmer 2400-8SA available.
Perkin-Elmer 2400-8L Perkin-Elmer Sputtering Deposition Download Information
PDFWORD
Series 2400
Highest Quality Sputtering-
Superior Performance-
Wide Selection of options-
In a laboratory or low-volume production environment, where the
high throughput levels of the 4400 Series are not required, the 2400
Series is the ideal alternative for high quality sputtering in a wide
variety of applications.
Model 2400-8SA
The Perkin-Elmer Model 2400-8SA features a large 211/2" rotating,
water cooled annular table with a capacity of sixty-four 2", thirty
3", or thirteen 4" wafers.
Used in conjunction with a cathode shaping aperture, the rotating
table permits high uniformity. A 4" wafer vertical range of the table
facilitates coating bulk substrates. As an added feature, up to three
8" round cathodes may be specified allowing sequential deposition
from several targets or alternately, static deposition or heating from
any target position.
Power Splitting is an optional feature of the 2400-8SA system.
With this feature, RF power can be applied to two cathodes
simultaneously in any desired ratio from 5 to 95%. Combined with
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