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MICRO-ELECTRO-MECHANICAL
SYSTEMS
KAUSHAL PANT BSc, BA, B Tech
AIM
TO GIVE AN OVERVIEW ABOUT
MEMS
PREVIEW
• MEMS Introduction
• History
• Fabrication and Basic techniques
• Applications
• Advantages & Disadvantages
• Future Trends
• MEMS in India
• Conclusion
• References
• Technology of Microscopic devices & miniaturized
Integrated systems
• Components 1 and 100 micrometres in size.
• Devices 20 micrometres to a millimetre (i.e. 0.02 to
1.0 mm)
• Micro-sized components assembled & working together
as a system
INTRODUCTION
WHAT IS MEMS?
• Technique of combining Electrical & Mechanical disiciplines.
• System of miniature dimensions.
• Micro fabrication technologies.
• Both sense on Micro scale effect on Macro scale
• Control the environment.
• Potential to effect all of our lives
5
WHAT IS MEMS?
6
• Micro-electronics - Brain of the system.
• Micro-sensors - Arms ,eyes, nose etc.
• Micro-actuator - Switch or trigger.
• Micro-structure -Micromachining
ON SIZE AND SCALE
WHY MICROMACHINE
• Minimize energy and mtrls use in manufacturing.
• Integration with electronics, reduction of power budget.
• Faster devices, incr selectivity and sensitivity.
• Cost/Performance advantages.
• Improved reproducibility (batch fabrication).
• Improved accuracy and reliability.
• Minimally invasive (e.g. pill camera).
HISTORY
• 1947 : Telephone by Bell
• 1958 : First IC (Ge).01 Transistor, 03 Resistors, 01
Capacitor.
• 1959: Richard Feynman, California “There’s Plenty of
Room at the Bottom”. $1000 for car 1/64th of an inch.
• 1961: First si pressure sensor demonstrated.
• 1967: Invention of surface micromachining.
• 1970: First silicon accelerometer demonstrated.
• 1979: First micromachined inkjet nozzle.
HISTORY
• 1980: First experiments in surface micromachined silicon.
• 1982: Disposable blood pressure transducer and LIGA
• 1988: MEMS was coined ,First MEMS conference.
• 1990: Micromachining towards improving sensors.
• 1992: Multi-User MEMS Process (MUMPS) by DARPA).
• 2001: Triaxis accelerometers appear on the market.
• 2004: TI’s DLP chip sales rose to $900 million.
• 2007: MEMS industry group (MEMS-IG)
• 2017: MEMS devices permeate our lives.
SUBTRATES
• Silicon
• Glass
• Polymers
• Metals - Metals like Gold, Ni, Al, Cr, Pl, and Ag
• Ceramics
12
FABRICATION
13
Basic Process
Deposition Patterning Etching
Chemical
Wet
Dry
Physical
Lithography
Photolithography
BASIC PROCESS OF FABRICATION
• Deposition
– Deposition that happen because of a Chemical reaction or
Physical reaction.
• Patterning
– Transfer to a photosensitive material, exposure to UV light.
– Developed in solution after exposure to UV.
– Material Etch away.
• Etching
– Strong acid to cut into the unprotected parts of a metal
surface to create a design.
– Two classes :
• Wet Etching
• Dry Etching.
14
FABRICATION
15
Photolithography.
FABRICATION
16
2. Etching.
a) Dry
b) Wet
FABRICATION
17
a) Photolithography.
DEPOSITION
a) Physical Vapour Deposition.
• Thin films one atom (or molecule)
• Physical coating.
• Deposition of aluminium or gold conductors.
b) Chemical Vapour Deposition.
• Volatile precursors on wafer react and/or decompose
• High-purity, high-performance solid materials.
MEMS MANUFACTURING
TECHNOLOGY
19
a) Bulk Micromachining.
b) Surface Micromachining.
c) High Aspect Ratio (HAR) Si Micromachining.
• LIGA
• SLIGA
LIGA
20
Lithographie (Lithography), Galvanoformung (Electroforming), &
Abformung (Molding)
• Additive Process
• HARMST-High Aspect Ratio Microstructure Technology.
• Precise dimensions and good surface roughness.
• Output- Finished parts, molds, or stamps
• SLIGA (Sacrificial LIGA). lower manufacturing
infrastructures
LIGA
Photo sensitive Material PMMA –Poly methyl metha crylate
PACKAGING
a) Protection & robust to operating environment.
b) Access and connections to physical domain.
c) Minimize electrical interference.
d) Dissipate heat for high operating temperatures.
e) Minimize stress from external loading.
f) Electric Power handling without signal disruption.
PACKAGING
MEMS APPLICATION
MICRO NANO
WORLD
MEMS IN DEF
BIO MEMS
MICRO PROBING
(STF,AFM)
PRESSURE
,FORCE,INTERTIAL
,SOUNDS
MICRO MAGNETICS
RF MEMS
MICRO FLUIDICS MICRO IT
MEMS ADVANTAGES
IC COMPATIBLE
LOW COST
RUGGEDNESS
SMALLER
BATCH FABRICATION
MINIATURIZATION
LOW POWER CONSUMPTION
HIGHER PERFORMANCE
DISADVANTAGES
• Impossible to transfer of Power impossible.
• Poly-Si (a brittle material), Cannot be load and force limitations.
• Disruptive technology, need different capabilities and
competencies.
• Scaling, Packaging and Testing Issues.
• Challenges associated with developing manufacturing
processes.
• Critical technological bottlenecks, economic feasibility.
• Time & expense.
FUTURE OF MEMS
Challenges
• Access to Foundries.
• Design Simulation & Modelling
• Packaging and Testing
• Standardization
• Education and Training.
• Micro-sized objects allow us to go places where no objects
have gone before.
MEMS IN INDIA
• Jul 2002 first Lab ( IISc & CSI Ltd)
• Microelectronics Group & Suman Mashruwala Micro-
engineering Lab, IIT Bombay
• Fabrication facilities at:
• CEERI Pilani, ITI, BEL in Bangalore, SCL Chandigarh etc.
• Microelectronics Laboratories in close interaction with Indian
industries (BEL, DRDO , ISRO etc)
• MEMS work in Acoustic Sensor & Ultrasound sensors, in
GSLV & PSLV.
• Development of analytic tools and software.
CONCLUSION
• Promising technology for the 21st Century.
• Disruptive technology differs significantly from existing
technology.
• Challenges associated with developing manufacturing
processes.
• Automotive industry varied signatures in all fields.
• MEMS has gradually made its way out of research
laboratories and into everyday products.
THANK YOU

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Overview of Micro-Electro-Mechanical Systems (MEMS

  • 2. AIM TO GIVE AN OVERVIEW ABOUT MEMS
  • 3. PREVIEW • MEMS Introduction • History • Fabrication and Basic techniques • Applications • Advantages & Disadvantages • Future Trends • MEMS in India • Conclusion • References
  • 4. • Technology of Microscopic devices & miniaturized Integrated systems • Components 1 and 100 micrometres in size. • Devices 20 micrometres to a millimetre (i.e. 0.02 to 1.0 mm) • Micro-sized components assembled & working together as a system INTRODUCTION
  • 5. WHAT IS MEMS? • Technique of combining Electrical & Mechanical disiciplines. • System of miniature dimensions. • Micro fabrication technologies. • Both sense on Micro scale effect on Macro scale • Control the environment. • Potential to effect all of our lives 5
  • 6. WHAT IS MEMS? 6 • Micro-electronics - Brain of the system. • Micro-sensors - Arms ,eyes, nose etc. • Micro-actuator - Switch or trigger. • Micro-structure -Micromachining
  • 7. ON SIZE AND SCALE
  • 8.
  • 9. WHY MICROMACHINE • Minimize energy and mtrls use in manufacturing. • Integration with electronics, reduction of power budget. • Faster devices, incr selectivity and sensitivity. • Cost/Performance advantages. • Improved reproducibility (batch fabrication). • Improved accuracy and reliability. • Minimally invasive (e.g. pill camera).
  • 10. HISTORY • 1947 : Telephone by Bell • 1958 : First IC (Ge).01 Transistor, 03 Resistors, 01 Capacitor. • 1959: Richard Feynman, California “There’s Plenty of Room at the Bottom”. $1000 for car 1/64th of an inch. • 1961: First si pressure sensor demonstrated. • 1967: Invention of surface micromachining. • 1970: First silicon accelerometer demonstrated. • 1979: First micromachined inkjet nozzle.
  • 11. HISTORY • 1980: First experiments in surface micromachined silicon. • 1982: Disposable blood pressure transducer and LIGA • 1988: MEMS was coined ,First MEMS conference. • 1990: Micromachining towards improving sensors. • 1992: Multi-User MEMS Process (MUMPS) by DARPA). • 2001: Triaxis accelerometers appear on the market. • 2004: TI’s DLP chip sales rose to $900 million. • 2007: MEMS industry group (MEMS-IG) • 2017: MEMS devices permeate our lives.
  • 12. SUBTRATES • Silicon • Glass • Polymers • Metals - Metals like Gold, Ni, Al, Cr, Pl, and Ag • Ceramics 12
  • 13. FABRICATION 13 Basic Process Deposition Patterning Etching Chemical Wet Dry Physical Lithography Photolithography
  • 14. BASIC PROCESS OF FABRICATION • Deposition – Deposition that happen because of a Chemical reaction or Physical reaction. • Patterning – Transfer to a photosensitive material, exposure to UV light. – Developed in solution after exposure to UV. – Material Etch away. • Etching – Strong acid to cut into the unprotected parts of a metal surface to create a design. – Two classes : • Wet Etching • Dry Etching. 14
  • 18. DEPOSITION a) Physical Vapour Deposition. • Thin films one atom (or molecule) • Physical coating. • Deposition of aluminium or gold conductors. b) Chemical Vapour Deposition. • Volatile precursors on wafer react and/or decompose • High-purity, high-performance solid materials.
  • 19. MEMS MANUFACTURING TECHNOLOGY 19 a) Bulk Micromachining. b) Surface Micromachining. c) High Aspect Ratio (HAR) Si Micromachining. • LIGA • SLIGA
  • 20. LIGA 20 Lithographie (Lithography), Galvanoformung (Electroforming), & Abformung (Molding) • Additive Process • HARMST-High Aspect Ratio Microstructure Technology. • Precise dimensions and good surface roughness. • Output- Finished parts, molds, or stamps • SLIGA (Sacrificial LIGA). lower manufacturing infrastructures
  • 21. LIGA Photo sensitive Material PMMA –Poly methyl metha crylate
  • 22. PACKAGING a) Protection & robust to operating environment. b) Access and connections to physical domain. c) Minimize electrical interference. d) Dissipate heat for high operating temperatures. e) Minimize stress from external loading. f) Electric Power handling without signal disruption.
  • 24. MEMS APPLICATION MICRO NANO WORLD MEMS IN DEF BIO MEMS MICRO PROBING (STF,AFM) PRESSURE ,FORCE,INTERTIAL ,SOUNDS MICRO MAGNETICS RF MEMS MICRO FLUIDICS MICRO IT
  • 25. MEMS ADVANTAGES IC COMPATIBLE LOW COST RUGGEDNESS SMALLER BATCH FABRICATION MINIATURIZATION LOW POWER CONSUMPTION HIGHER PERFORMANCE
  • 26. DISADVANTAGES • Impossible to transfer of Power impossible. • Poly-Si (a brittle material), Cannot be load and force limitations. • Disruptive technology, need different capabilities and competencies. • Scaling, Packaging and Testing Issues. • Challenges associated with developing manufacturing processes. • Critical technological bottlenecks, economic feasibility. • Time & expense.
  • 27. FUTURE OF MEMS Challenges • Access to Foundries. • Design Simulation & Modelling • Packaging and Testing • Standardization • Education and Training. • Micro-sized objects allow us to go places where no objects have gone before.
  • 28. MEMS IN INDIA • Jul 2002 first Lab ( IISc & CSI Ltd) • Microelectronics Group & Suman Mashruwala Micro- engineering Lab, IIT Bombay • Fabrication facilities at: • CEERI Pilani, ITI, BEL in Bangalore, SCL Chandigarh etc. • Microelectronics Laboratories in close interaction with Indian industries (BEL, DRDO , ISRO etc) • MEMS work in Acoustic Sensor & Ultrasound sensors, in GSLV & PSLV. • Development of analytic tools and software.
  • 29. CONCLUSION • Promising technology for the 21st Century. • Disruptive technology differs significantly from existing technology. • Challenges associated with developing manufacturing processes. • Automotive industry varied signatures in all fields. • MEMS has gradually made its way out of research laboratories and into everyday products.

Editor's Notes

  1. The question that arises in our mind is what is mems or micro Electro-mechanical system? It is a technique of combining control on electrical and mechanical components together on a chip. It produce a system of miniature(small version of something) dimensions i.e the system having thickness less than the thickness of human hair. The components are integrated on a single chip using micro fabrication technology which allows the microsystem to both sense & control the environment.
  2. Microelectronics- Brain of the system, receives data/info, process this information and signal the microactuators to react and create some form of changes to the environment. b) Microsensors- arms ,eyes, nose etc. They collect data and detect changes in the system’s environment by measuring mechanical, thermal, magnetic, chemical phenomena or electromagnetic information and pass this information to microelectronics for processing.   c) A microactuator acts as a switch or a trigger to activate an external device. As the processed data is received. It takes decisions based on this data, sometimes activating an external device. d) Microstructure tiny structures built through micromachachining right into the silicon of the MEMS. These microstructures can be used as valves to control the flow of a substance or as very sm
  3. Excellent electronic characteristics & chemical and mechanical properties,Abundant, inexpensive, processed to unparalleled purity. Hookean Material Glass Microfluidics and Optics.CheaperChemical inertness, Isolator.Surface finish, Thermal stability
  4. Wafer [light thin flat surface] , Thin film - facilitate the deposition or formation of very thin films of different materials on a silicon wafer. D (deposit thin film material on object) - Spin-on(spin liquid into the wafer surface) , thermal oxidation , Chemical vapour deposition(film deposit using chemical reaction) , electroplating(forming film on cathode –ve charge) Wet Etching: where the material is dissolved when immersed in a chemical solution. Dry Etching: where the material is sputtered or dissolved using reactive ions or an etching agent.
  5. The MEMS devices, in marine sensing maybe attached to:  Ships  Floating devices (buoys) in the sea  Fixed sea structures (like oil rigs)  Sea bed using links  AUVs(Autonomous Underwater Vehicle)
  6. The MEMS devices, in marine sensing maybe attached to:  Ships  Floating devices (buoys) in the sea  Fixed sea structures (like oil rigs)  Sea bed using links  AUVs(Autonomous Underwater Vehicle)