The document describes research into fabricating micro vias in LCP substrate using mechanical punching and subsequent cleaning. Chemical etching using sodium permanganate and sodium hydroxide was found to effectively remove LCP and copper burr leftovers from punching. However, carbonated LCP debris remained. 30 minutes of oxygen plasma cleaning at 125 watts power successfully removed the debris, yielding uniform via walls. The sequential process of wet etching and plasma cleaning was necessary for clean micro via fabrication using mechanical punching.