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© 2014
Copyrights © Yole Développement SA. All rights reserved.
GaN-on-Si Technology and Market
for LED and power electronics
Applications
75 cours Emile Zola, F-69001 Lyon-Villeurbanne, France
Tel : +33 472 83 01 80 - Fax : +33 472 83 01 83
Web: http://www.yole.fr
OSRAM Aixtron CREELumiledsVerticle
Inc
FBHEpiGaN
AZZURRO
FBH EPC Corp. IMEC
Toshiba Plessey
© 2014• 2
Copyrights © Yole Développement SA. All rights reserved.
GaN on Si Substrates
Mass-market introduction in various applications
< 2009 20122010 2011 2013
GaN/Sapphire
> 2020
GaN/SiC
OptoLEDOptoLaserRFElectron.PowerElectron.
GaN/Sapphire LOG
GaN/bulk GaN
GaN/Silicon
GaN/S.I. SiC
GaN/Silicon
GaN/AlN
GaN/bulk GaN
GaN/AlN
Bonded GaN /
Diamond
GaN/bulk GaNGaN/Silicon
Bonded GaN /
Diamond
Executive Summary
Topgan
Soraa
2014
Engineered
substrates
2017
GaN/bulk GaN
© 2014• 3
Copyrights © Yole Développement SA. All rights reserved.
Mapping of Open Market players
Executive Summary
We have not observed an absolute
dominance from one region.
© 2014• 4
Copyrights © Yole Développement SA. All rights reserved.
2013-2020 6” GaN-on-Si Epiwafer volumes:
Open + Captive Market
In terms of volume, LED will lead the GaN on Si applications till 20XX. Power GaN business would catch up if
the commercialization of GaN 600 V devices will be concretized in the following 1-2 years. The total epiwafer
volume will exceed X.X Munits in 2020.
Executive Summary
© 2014• 5
Copyrights © Yole Développement SA. All rights reserved.
Comparison of Epitaxy Techniques
MBE MOCVD Plasma assisted
MOCVD
HVPE
Source Metal, gas
MO, NH3
(Carrier gas also needed)
N2 , MO Metal, NH3
Source Safety Safe Higher safety risk Safer compared to MOCVD Safe
Deposition
Temperature
750°C-900°C for GaN
~ 700°C for InGaN
950-1150°C for p-GaN and
n-GaN
<800°C for InGaN
<700°C for all layers <1150°C
Pressure UHV: 10-10 – 10-11 Torr 15-750 Torr / 760 Torr
Deposition speed 1 um/h 1 to 10 um/h typically < 0.5 um/hour 50 to 200 um/h
Interface control Very good: atomic layers
Medium: layers below 3-4
nm difficult
Poor? Poor
Parasitic reactions
None (reaction only on
substrate)
High High High
Uptime (Cleaning)
• 6-12 month campaigns
without cleaning but
maintenance cycles can last
several weeks
•Other maintenance driven
by sources replenishment.
Cleaning maintenance
cycles <12 hours. Recent
commercial system can
provide 20 to 30 runs
without cleaning (~6-10
days)
?
Heavy cleaning maintenance
Comment
•Good layer thickness and
composition controls.
•Mainly used for R&D and
complex novel structures
•Wafer production
•LED and power devices
productions
Emerging.
Bluglass ($2.7M for GaN
RPCVD process, including
for Si)
Kyma Technology (US);
HVPE on AlN/Si templates
LumiGNtech Co., Ltd (KR)
Samsung/SNU (KR) : free-
standing GaN on Si (2”)
GaN on Si Technology
© 2014• 6
Copyrights © Yole Développement SA. All rights reserved.
Different types of buffer layers
Al containing Others
AlN ou AlGaN single layer
Superlattices (SLs)
made of GaN and Al(Ga)N layers
ReO*, HfN, BP,ZrB2, ScN,
Al2O3…..
EpiGaN (BE)
Dowa(JP)
University Magdeburg (GE)
ReO: Translucent (US)
Si
GaN
Si
Al(Ga)N
GaN
Al(Ga)N
GaN
Si
Others
GaN
GaN on Si Technology
* Re: Rare earth
© 2014• 7
Copyrights © Yole Développement SA. All rights reserved.
• Unlike sapphire, which is transparent, silicon re-absorbs most of the light emitted toward the
substrate.
• This significantly decreases the efficiency of the LED.
• The most common solution to the problem is to use a vertical LED structure:
• Step #1: The LED + substrate structure is flipped and bonded onto another Si carrier substrate with a mirror
layer.
• Step #2: The epitaxial silicon substrate is removed.
• In order to reduce cost, the carrier substrate can be a (100) Si wafers (the epitaxy must be
performed on a less standard (111) wafer)
n-GaN
p-GaN
Silicon Substrate
Active layers
Emitted light
Absorbed light
n-GaN
p-GaN
Silicon Substrate
Mirror layer
n-GaN
p-GaN
Silicon Substrate
Carrier substrate
(Si)
n-GaN
p-GaN
Carrier substrate
(Si)
LED-on-Si Mirror layer deposition Carrier Substrate Bonding Silicon substrate removal
Mirror layer Mirror layer
Light Absorption by Si:
Impact on LED Structure and Process
Illustration: Bonding and removal process for LED-On-Si
LED Applications
© 2014• 8
Copyrights © Yole Développement SA. All rights reserved.
Dec. 2013
Plessey
PLW114050:
64 lm/W
Jul. 2013
Plessey LED
PLW111010 :
36 lm/W30
60
120
150
180
0
Seoul Semiconductor
STW8Q14C
175 lm/w
Apr. 2013
Low and Mid power
package, cold white
(5000-5500k)
Best performance based
on company claims
Samsung
LM561B
170 lm/W
Everlight
L62-217D
150 lm/W
Osram
Lab result:
104lm/W
Lumileds
Luxeon 3535 2D
150 lm/W
Toshiba
TL1F2
140 lm/W
In development
(no release date)
Sapphire
Silicon
Cree
XLamp XH
170 lm/w
Toshiba
TL2FK :
110 lm/W
90
Cree
Lab
> 200 lm/w
LED-On-Si Performance:
Commercial Status (Q1-2014)
Lattice Power*
LPIBB55A:
140 lm/W
*Available as die. Lm/w of white package Led is extrapolated
LED Applications
© 2014• 9
Copyrights © Yole Développement SA. All rights reserved.
Cost Simulation
Process Flow
• A generic “Yole LED-On-Si” die manufacturing process flow was created (below). The visual
process flow is presented in the following slides.
• Die manufacturing was modeled all the way through dicing. Packaging is not included.
• For comparisons, a process flow for a generic “Yole – Vertical LED on Sapphire” was simulated
(including Laser Lift Off and Bonding).
1) Epitaxy
2) Si Carrier
Preparation
3) Wafer Processing
4) Bonding
5) Back end 0
LED Applications
© 2014• 10
Copyrights © Yole Développement SA. All rights reserved.
Key Players
Industry (2)
Country Type Status Product (s) Technology Diameter Comments
Company A CN
Emerging
LED
maker
In
production
LED Die
Strain engineering
+ trenches.
2”.
6” in
development
Total investment > US$120m
Offering both Sapphire and Si
based LED chips
Company B KR
Large
group
R&D
Packaged
LED
? ?
First LED company to adopt
6” sapphire for volume
manufacturing.
Company C JP
#1 LED
Maker
R&D
Packaged
LED
? ?
Concluded that Si platform is
not competitive against
sapphire
Company D DE
Leading
LED
Maker
R&D/Pilot
Packaged
LED
Licensed from XXX
in 2009, +
collaboration with
U. of Magdeburg
and internal effort
6”
Significant progress with Si
but no commitment yet
regarding volume
manufacturing
Company E US
Leading
LED
Maker
R&D
Packaged
LED
? 3”, 6”
Concluded that Si platform is
not competitive against
sapphire in the short/mid term
Company F UK
Emerging
LED
maker
In
production
Packaged
LED
Strain engineering +
SiN interlayers for
dislocation control.
Thin epistructure
(2.5 µm).
6”
LED Technology acquired in
2011 from XXX, a Cambridge
University spin off
LED Applications
© 2014• 11
Copyrights © Yole Développement SA. All rights reserved.
Start-up or LED company
looking for “Fabless”
model
Will LED-on-Si Happen?
Large Semiconductor
company with existing
CMOS capacity
Tier one LED Maker with
advanced LED on
sapphire technology and
large installed capacity
Incentive
Incentive for Si adoption vary from one LED maker to another!
Samsung, TSMC,
Toshiba…
Aledia, Glo, smaller LED
makers with limited access
to capital…
Will “LED foundry” service
emerge?
LED Applications
© 2014• 12
Copyrights © Yole Développement SA. All rights reserved.
Power GaN Introduction
• AC to DC or DC to AC conversion is always associated with substantial energy losses that
increase with higher power and operating frequencies. Existing and emerging energy
production and transport technologies require high performance conversion device in order
to perform efficiently and save energy.
• GaN based power electronics have the potential to significantly improve efficiency at both
high power and frequencies while reducing device complexity and weight.
Wind
Solid State
Transformers
Electric &
Hybrid Vehicles
– Buck/booster
converters,
Inverters.
Digitally
controlled
converters &
regulators
Source: EPRI “The green Grid”, Georgia Tech IT
Power Electronics Applications
© 2014• 13
Copyrights © Yole Développement SA. All rights reserved.
Recent M&A, Investments and
Fund Raisings in the GaN Area
Power Electronics Applications
20102009
Funding: €14.5M
Nov 2010
2011
Acquisition of Velox
Feb. 2011
Series C funding: $20M
Feb 2011Series A&B funding: $18M
Funding: €4M
July 2011
Series D funding: $25M
June 2011
Funding: $2.6M
Nov 2011
CamGaN (UK)
$16M funding over past 10 years
2012
Series B funding
June 2012
Funding: €2.6M
July 2012
Series E funding: $35M
Sept. 2012
2013
UK gov. funding:
~$3M
May 2013
DoE funding: ?$
Sept 2013
© 2014• 14
Copyrights © Yole Développement SA. All rights reserved.
2020 projection GaN device state-of-the-art
(V & Amp) vs. application requests
Requested
current / chip
200V 1.2kV0
Requested
Voltage
600V 1.7kV 2.5kV+
Commercialized
Motor Drives
PV InverterPFC / POL for telecom
PFC / POL for
consumer
UPS < 1kW
EV/HEV Inverter
UPS > 1kW
EV/HEV
charger
Wind
Turbine
Rail traction
prototyping
0
>50A
5A
20A
Power Electronics Applications
© 2014• 15
Copyrights © Yole Développement SA. All rights reserved.
GaN-on-Si Epiwafers Will Reach 1.6 % of
the Overall Power Substrate Volume by 2020…
Power Electronics Applications
Next slide
© 2014• 16
Copyrights © Yole Développement SA. All rights reserved.
Main Specifications of Players (1/2)
Company Company A Company B Company C Company D
Country GE US JP BE
Business
Model
Power Electronics
RF, Power Electronics
and LED
LED
Power Electronics
Power Electronics
RF
Products
Template
Epiwafer
Epiwafer Epiwafers Epiwafer
TD 5X10-8 10-9
GaN thickness Up to 6 µm / /
Typically 2µm for RF
and 4.5 µm for power
Diameter Up to 8” 6”, 8”? 3", 4", 5"and 6“ from 2” up to 6”
Comments
Focus on Power
Electronics Market
(600 V),
Licensing I for LED
applications
Joined the IMEC GaN
on Si program in
January 2011. Intend to
supply GaN epiwafer to
RF, Power and LED
markets
8” coming soon
8” sampling,
GaN on Si Market
© 2014• 17
Copyrights © Yole Développement SA. All rights reserved.
Compound Semiconductors reports from YOLE
UV LED MARKET
LED Packaging
LED Front End
Manufacturing
Technologies
GaAs Wafer Market
& Applications
III-V Epitaxy Substrates
& Equipment Market
Sapphire
CoSim+
New!
Sapphire for
Electronics, Car,
Defense…
Status of the LED
Industry
New!New!
Bulk & freestanding
GaN
New!
Diamonds
SiC Market 2013
New!
Graphene
© 2014• 18
Copyrights © Yole Développement SA. All rights reserved.
Yole Activities
© 2012 18
MEDIA
News portal/Technology magazines/
Webcasts/Communication services
REPORTS
Market & technology/Patent
Investigation/Reverse costing
CONSULTING
Market research/Technology
& Strategy/Patent Investigation/
Reverse costing
www.yole.fr
www.yolefinance.fr
YOLE FINANCE
M&A/ Due Diligence/ Fundraising/
Technology brokerage
SISTER COMPANY
Reverse engineering & costing/
Cost simulation tools
© 2014• 19
Copyrights © Yole Développement SA. All rights reserved.
For More Information…
Please take a look at our websites:
www.yole.fr
Yole Développement corporate website
www.i-micronews.com
News Portal - free online registration to our publications
www.systemplus.fr
Sister company; expert in teardown & reverse costing analysis
www.yolefinance.com
Separate Yole business unit dedicated to financial services
Follow us on
Our Offices & Contact Information
© 2014• 20
Copyrights © Yole Développement SA. All rights reserved.
Our Offices & Contact Information
Europe Office
• Yves Devigne, Europe Business Development Manager,
Cell: 33 6 75 80 08 25 - Email: devigne@yole.fr
• David Jourdan, Headquarter Sales Coordination & Customer Service,
Tel: 33 472 83 01 90, Email: jourdan@yole.fr
USA Office
• Michael McLaughlin, Business Development Manager,
Phone: (650) 931 2552 - Cell: (408) 839 7178 - Email: mclaughlin@yole.fr
• Jeff Edwards, Sales Associate, Yole Inc., Cell: (972) 333 0986- Email: edwards@yole.fr
Japan Office
• For custom research: Yutaka Katano, General Manager, Yole Japan & President, Yole K.K.
Phone: (81) 362 693 457 - Cell: (81) 80 3440 6466 - Fax: (81) 362 693 448 - Email: katano@yole.fr
• For reports business: Takashi Onozawa, Sales Asia & General Manager, Yole K.K.
Email: onozawa@yole.fr
Korea Office
• Hailey Yang, Business Development Manager
Phone : (82) 2 2010 883 - Cell: (82) 10 4097 5810 - Fax: (82) 2 2010 8899 - Email: yang@yole.fr

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GaN-on-Si Substrate Technology and Market for LED and Power Electronics

  • 1. © 2014 Copyrights © Yole Développement SA. All rights reserved. GaN-on-Si Technology and Market for LED and power electronics Applications 75 cours Emile Zola, F-69001 Lyon-Villeurbanne, France Tel : +33 472 83 01 80 - Fax : +33 472 83 01 83 Web: http://www.yole.fr OSRAM Aixtron CREELumiledsVerticle Inc FBHEpiGaN AZZURRO FBH EPC Corp. IMEC Toshiba Plessey
  • 2. © 2014• 2 Copyrights © Yole Développement SA. All rights reserved. GaN on Si Substrates Mass-market introduction in various applications < 2009 20122010 2011 2013 GaN/Sapphire > 2020 GaN/SiC OptoLEDOptoLaserRFElectron.PowerElectron. GaN/Sapphire LOG GaN/bulk GaN GaN/Silicon GaN/S.I. SiC GaN/Silicon GaN/AlN GaN/bulk GaN GaN/AlN Bonded GaN / Diamond GaN/bulk GaNGaN/Silicon Bonded GaN / Diamond Executive Summary Topgan Soraa 2014 Engineered substrates 2017 GaN/bulk GaN
  • 3. © 2014• 3 Copyrights © Yole Développement SA. All rights reserved. Mapping of Open Market players Executive Summary We have not observed an absolute dominance from one region.
  • 4. © 2014• 4 Copyrights © Yole Développement SA. All rights reserved. 2013-2020 6” GaN-on-Si Epiwafer volumes: Open + Captive Market In terms of volume, LED will lead the GaN on Si applications till 20XX. Power GaN business would catch up if the commercialization of GaN 600 V devices will be concretized in the following 1-2 years. The total epiwafer volume will exceed X.X Munits in 2020. Executive Summary
  • 5. © 2014• 5 Copyrights © Yole Développement SA. All rights reserved. Comparison of Epitaxy Techniques MBE MOCVD Plasma assisted MOCVD HVPE Source Metal, gas MO, NH3 (Carrier gas also needed) N2 , MO Metal, NH3 Source Safety Safe Higher safety risk Safer compared to MOCVD Safe Deposition Temperature 750°C-900°C for GaN ~ 700°C for InGaN 950-1150°C for p-GaN and n-GaN <800°C for InGaN <700°C for all layers <1150°C Pressure UHV: 10-10 – 10-11 Torr 15-750 Torr / 760 Torr Deposition speed 1 um/h 1 to 10 um/h typically < 0.5 um/hour 50 to 200 um/h Interface control Very good: atomic layers Medium: layers below 3-4 nm difficult Poor? Poor Parasitic reactions None (reaction only on substrate) High High High Uptime (Cleaning) • 6-12 month campaigns without cleaning but maintenance cycles can last several weeks •Other maintenance driven by sources replenishment. Cleaning maintenance cycles <12 hours. Recent commercial system can provide 20 to 30 runs without cleaning (~6-10 days) ? Heavy cleaning maintenance Comment •Good layer thickness and composition controls. •Mainly used for R&D and complex novel structures •Wafer production •LED and power devices productions Emerging. Bluglass ($2.7M for GaN RPCVD process, including for Si) Kyma Technology (US); HVPE on AlN/Si templates LumiGNtech Co., Ltd (KR) Samsung/SNU (KR) : free- standing GaN on Si (2”) GaN on Si Technology
  • 6. © 2014• 6 Copyrights © Yole Développement SA. All rights reserved. Different types of buffer layers Al containing Others AlN ou AlGaN single layer Superlattices (SLs) made of GaN and Al(Ga)N layers ReO*, HfN, BP,ZrB2, ScN, Al2O3….. EpiGaN (BE) Dowa(JP) University Magdeburg (GE) ReO: Translucent (US) Si GaN Si Al(Ga)N GaN Al(Ga)N GaN Si Others GaN GaN on Si Technology * Re: Rare earth
  • 7. © 2014• 7 Copyrights © Yole Développement SA. All rights reserved. • Unlike sapphire, which is transparent, silicon re-absorbs most of the light emitted toward the substrate. • This significantly decreases the efficiency of the LED. • The most common solution to the problem is to use a vertical LED structure: • Step #1: The LED + substrate structure is flipped and bonded onto another Si carrier substrate with a mirror layer. • Step #2: The epitaxial silicon substrate is removed. • In order to reduce cost, the carrier substrate can be a (100) Si wafers (the epitaxy must be performed on a less standard (111) wafer) n-GaN p-GaN Silicon Substrate Active layers Emitted light Absorbed light n-GaN p-GaN Silicon Substrate Mirror layer n-GaN p-GaN Silicon Substrate Carrier substrate (Si) n-GaN p-GaN Carrier substrate (Si) LED-on-Si Mirror layer deposition Carrier Substrate Bonding Silicon substrate removal Mirror layer Mirror layer Light Absorption by Si: Impact on LED Structure and Process Illustration: Bonding and removal process for LED-On-Si LED Applications
  • 8. © 2014• 8 Copyrights © Yole Développement SA. All rights reserved. Dec. 2013 Plessey PLW114050: 64 lm/W Jul. 2013 Plessey LED PLW111010 : 36 lm/W30 60 120 150 180 0 Seoul Semiconductor STW8Q14C 175 lm/w Apr. 2013 Low and Mid power package, cold white (5000-5500k) Best performance based on company claims Samsung LM561B 170 lm/W Everlight L62-217D 150 lm/W Osram Lab result: 104lm/W Lumileds Luxeon 3535 2D 150 lm/W Toshiba TL1F2 140 lm/W In development (no release date) Sapphire Silicon Cree XLamp XH 170 lm/w Toshiba TL2FK : 110 lm/W 90 Cree Lab > 200 lm/w LED-On-Si Performance: Commercial Status (Q1-2014) Lattice Power* LPIBB55A: 140 lm/W *Available as die. Lm/w of white package Led is extrapolated LED Applications
  • 9. © 2014• 9 Copyrights © Yole Développement SA. All rights reserved. Cost Simulation Process Flow • A generic “Yole LED-On-Si” die manufacturing process flow was created (below). The visual process flow is presented in the following slides. • Die manufacturing was modeled all the way through dicing. Packaging is not included. • For comparisons, a process flow for a generic “Yole – Vertical LED on Sapphire” was simulated (including Laser Lift Off and Bonding). 1) Epitaxy 2) Si Carrier Preparation 3) Wafer Processing 4) Bonding 5) Back end 0 LED Applications
  • 10. © 2014• 10 Copyrights © Yole Développement SA. All rights reserved. Key Players Industry (2) Country Type Status Product (s) Technology Diameter Comments Company A CN Emerging LED maker In production LED Die Strain engineering + trenches. 2”. 6” in development Total investment > US$120m Offering both Sapphire and Si based LED chips Company B KR Large group R&D Packaged LED ? ? First LED company to adopt 6” sapphire for volume manufacturing. Company C JP #1 LED Maker R&D Packaged LED ? ? Concluded that Si platform is not competitive against sapphire Company D DE Leading LED Maker R&D/Pilot Packaged LED Licensed from XXX in 2009, + collaboration with U. of Magdeburg and internal effort 6” Significant progress with Si but no commitment yet regarding volume manufacturing Company E US Leading LED Maker R&D Packaged LED ? 3”, 6” Concluded that Si platform is not competitive against sapphire in the short/mid term Company F UK Emerging LED maker In production Packaged LED Strain engineering + SiN interlayers for dislocation control. Thin epistructure (2.5 µm). 6” LED Technology acquired in 2011 from XXX, a Cambridge University spin off LED Applications
  • 11. © 2014• 11 Copyrights © Yole Développement SA. All rights reserved. Start-up or LED company looking for “Fabless” model Will LED-on-Si Happen? Large Semiconductor company with existing CMOS capacity Tier one LED Maker with advanced LED on sapphire technology and large installed capacity Incentive Incentive for Si adoption vary from one LED maker to another! Samsung, TSMC, Toshiba… Aledia, Glo, smaller LED makers with limited access to capital… Will “LED foundry” service emerge? LED Applications
  • 12. © 2014• 12 Copyrights © Yole Développement SA. All rights reserved. Power GaN Introduction • AC to DC or DC to AC conversion is always associated with substantial energy losses that increase with higher power and operating frequencies. Existing and emerging energy production and transport technologies require high performance conversion device in order to perform efficiently and save energy. • GaN based power electronics have the potential to significantly improve efficiency at both high power and frequencies while reducing device complexity and weight. Wind Solid State Transformers Electric & Hybrid Vehicles – Buck/booster converters, Inverters. Digitally controlled converters & regulators Source: EPRI “The green Grid”, Georgia Tech IT Power Electronics Applications
  • 13. © 2014• 13 Copyrights © Yole Développement SA. All rights reserved. Recent M&A, Investments and Fund Raisings in the GaN Area Power Electronics Applications 20102009 Funding: €14.5M Nov 2010 2011 Acquisition of Velox Feb. 2011 Series C funding: $20M Feb 2011Series A&B funding: $18M Funding: €4M July 2011 Series D funding: $25M June 2011 Funding: $2.6M Nov 2011 CamGaN (UK) $16M funding over past 10 years 2012 Series B funding June 2012 Funding: €2.6M July 2012 Series E funding: $35M Sept. 2012 2013 UK gov. funding: ~$3M May 2013 DoE funding: ?$ Sept 2013
  • 14. © 2014• 14 Copyrights © Yole Développement SA. All rights reserved. 2020 projection GaN device state-of-the-art (V & Amp) vs. application requests Requested current / chip 200V 1.2kV0 Requested Voltage 600V 1.7kV 2.5kV+ Commercialized Motor Drives PV InverterPFC / POL for telecom PFC / POL for consumer UPS < 1kW EV/HEV Inverter UPS > 1kW EV/HEV charger Wind Turbine Rail traction prototyping 0 >50A 5A 20A Power Electronics Applications
  • 15. © 2014• 15 Copyrights © Yole Développement SA. All rights reserved. GaN-on-Si Epiwafers Will Reach 1.6 % of the Overall Power Substrate Volume by 2020… Power Electronics Applications Next slide
  • 16. © 2014• 16 Copyrights © Yole Développement SA. All rights reserved. Main Specifications of Players (1/2) Company Company A Company B Company C Company D Country GE US JP BE Business Model Power Electronics RF, Power Electronics and LED LED Power Electronics Power Electronics RF Products Template Epiwafer Epiwafer Epiwafers Epiwafer TD 5X10-8 10-9 GaN thickness Up to 6 µm / / Typically 2µm for RF and 4.5 µm for power Diameter Up to 8” 6”, 8”? 3", 4", 5"and 6“ from 2” up to 6” Comments Focus on Power Electronics Market (600 V), Licensing I for LED applications Joined the IMEC GaN on Si program in January 2011. Intend to supply GaN epiwafer to RF, Power and LED markets 8” coming soon 8” sampling, GaN on Si Market
  • 17. © 2014• 17 Copyrights © Yole Développement SA. All rights reserved. Compound Semiconductors reports from YOLE UV LED MARKET LED Packaging LED Front End Manufacturing Technologies GaAs Wafer Market & Applications III-V Epitaxy Substrates & Equipment Market Sapphire CoSim+ New! Sapphire for Electronics, Car, Defense… Status of the LED Industry New!New! Bulk & freestanding GaN New! Diamonds SiC Market 2013 New! Graphene
  • 18. © 2014• 18 Copyrights © Yole Développement SA. All rights reserved. Yole Activities © 2012 18 MEDIA News portal/Technology magazines/ Webcasts/Communication services REPORTS Market & technology/Patent Investigation/Reverse costing CONSULTING Market research/Technology & Strategy/Patent Investigation/ Reverse costing www.yole.fr www.yolefinance.fr YOLE FINANCE M&A/ Due Diligence/ Fundraising/ Technology brokerage SISTER COMPANY Reverse engineering & costing/ Cost simulation tools
  • 19. © 2014• 19 Copyrights © Yole Développement SA. All rights reserved. For More Information… Please take a look at our websites: www.yole.fr Yole Développement corporate website www.i-micronews.com News Portal - free online registration to our publications www.systemplus.fr Sister company; expert in teardown & reverse costing analysis www.yolefinance.com Separate Yole business unit dedicated to financial services Follow us on Our Offices & Contact Information
  • 20. © 2014• 20 Copyrights © Yole Développement SA. All rights reserved. Our Offices & Contact Information Europe Office • Yves Devigne, Europe Business Development Manager, Cell: 33 6 75 80 08 25 - Email: devigne@yole.fr • David Jourdan, Headquarter Sales Coordination & Customer Service, Tel: 33 472 83 01 90, Email: jourdan@yole.fr USA Office • Michael McLaughlin, Business Development Manager, Phone: (650) 931 2552 - Cell: (408) 839 7178 - Email: mclaughlin@yole.fr • Jeff Edwards, Sales Associate, Yole Inc., Cell: (972) 333 0986- Email: edwards@yole.fr Japan Office • For custom research: Yutaka Katano, General Manager, Yole Japan & President, Yole K.K. Phone: (81) 362 693 457 - Cell: (81) 80 3440 6466 - Fax: (81) 362 693 448 - Email: katano@yole.fr • For reports business: Takashi Onozawa, Sales Asia & General Manager, Yole K.K. Email: onozawa@yole.fr Korea Office • Hailey Yang, Business Development Manager Phone : (82) 2 2010 883 - Cell: (82) 10 4097 5810 - Fax: (82) 2 2010 8899 - Email: yang@yole.fr