1. 5-Feb-15 Page 1
Inspection Solutions Redefined
PDS-1020G2
Reticle Inspection System
Simultaneous Dual Sided Inspection

2. Background Information
5-Feb-15 Page 2
Now available from WIS, Inc., an inspection system that has
simultaneous high-throughput, double-sided inspection of photo
masks (original design). It can be easily modified to support other
substrates.
Our original concept was based on scattering measurements
from multiple lasers. The optical platform consisted of a
separate reticle chamber with controlled airflow to eliminate any
possibility of instrument-generated particle contamination. Since
that time, our concept has continuously improved to increase
sensitivity, eliminate laser diodes, and increase throughput.
Our latest Model PDS-1020G2 incorporates all these
improvements in a reduced footprint design.

3. 5-Feb-15 Page 3
PDS-1020G2 System Specifications

4. 5-Feb-15 Page 4
PDS-1020G2 Back Panel

5. 5-Feb-15 Page 5
PDS-1020G2 System Stage

6. 5-Feb-15 Page 6
PDS-1020G2 Features
• Complete Self Contained Reticle Inspection System
• Simultaneous Back Glass/Front Pellicle Inspection
• Interface/Control: Ethernet TCP/IP
• Internal Linear Stage (No Spinning of Reticle)
• Area CCD Array Provides High Sensitivity and Low
Distortion

7. 5-Feb-15 Page 7
Operating Principle (See next page)

8. 5-Feb-15 Page 8
Operating Principle
• Scattered Light from Defects Is Detected by High-Sensitivity
CCD Camera
• Background and Pattern Recognition Algorithms (option)
Minimize Pattern Clutter
• Dual-Pass Inspection Available for Maximum Sensitivity

9. 5-Feb-15 Page 9
Plug and Play Operation
• Inspection Area: Automatic or Multiple User-Definable
Regions-of-Interest
• Pellicle Frame Shape: Automatic or User-Definable
• Defect Size Classification Programmable: From 1µm to
100µm
• Size Filter: Automatic or User-Definable
• Pattern Rejection Filter: Automatic or User-Definable
(option)
• Pellicle Focus: Automatic (Range 0 to 10mm)
• Multiple Modes: Tradeoff Sensitivity vs. Throughput
(factory setup)

10. 5-Feb-15 Page 10
PDS-1020G2 Features / Benefits
• No Lasers (Therefore No Laser Safety Issues)
• No Laser Failures (Using Long-Life LEDs),
minimizing system maintenance
• No Alignment Issues Associated with Lasers

11. 5-Feb-15 Page 11
PDS-1020G2 Features / Benefits
• Airflow Exposure to Reticle Controlled by Chamber
Design
• Reticle Exposure to Ambient Is Minimized by Isolation
Compartment
• Moving Components Contained in Separate Compartment
• Electronics, Cooling and Venting Separate from Reticle
Airflow Path
• Design Minimizes Electrostatic Discharge

12. 5-Feb-15 Page 12
PDS-1020G2 Environmental Specs.
• Clean Room: Class 1
• Power: 120/240 VAC, 50/60 Hz, 200W
• Size: 38 x 33 x 69 cm
• Weight (Module): 35 kg (77 lb)

13. 5-Feb-15 Page 13
PDS-1020G2 Functional Specs.
• Mask Size: 152 x 152 mm
• Pellicle Height: 3 to 8 mm
• Inspected Surfaces: Pellicle and Back of Glass
• Inspection Area: Software Selectable
• Handling: Manual or Robotic
• Display: Host or Laptop Display
• Host Interface: Ethernet TCP/IP
• Set-Up: Menu Driven, User Programmable
• Illumination: High Intensity LEDs

14. 5-Feb-15 Page 14
PDS-1020G2 Performance Specs.
• Inspection Time (Both Sides):
20 sec. to 100 sec. (Operator Selectable)
• Repeatability
2-10 µm: > 96%
10-20 µm: > 97%
> 20 µm: > 98%
• Minimum Particle Size: ≥ 2 µm
• Spatial Resolution: 130 µm
• Position Accuracy: ± 0.25 mm
• Edge Exclusion: 2 mm
• Focus Range: 10 mm

15. 5-Feb-15 Page 15
PDS-1020G2 Software Packages
• Embedded Control Software Package – Standard
• Communicates with Host via TCP-IP Interface
• Stand-Alone Control Software Operates With Local PC
• Diagnostic Software Operates via Keyboard, Mouse and
Monitor
• Defect Analyzer for Offline Analysis of Data (option)
• Remote Control Software to Control System from Outside
Clean Room

16. 5-Feb-15 Page 16
Test Reticle Multiple Size PSL Spray
(Defect Map)
PSL Sizes:
• 5 µm
• 10 µm
• 15 µm
• 20 µm

17. 5-Feb-15 Page 17
Test Reticle Multiple Size PSL Spray
(Histogram)
PSL Sizes:
• 5 µm
• 10 µm
• 15 µm
• 20 µm

18. 5-Feb-15 Page 18
Reliable Detection of Smallest Particles
(Minimum Size 1 µm)

19. 5-Feb-15 Page 19
System Repeatability
Elapsed Time(Min): 0 5.11 10.26 15.39 20.55 25.68 30.85 35.98 41.11 46.25 51.39 56.53 Average StdDev Repeatability
Range:0-10 µm 1079 1117 1104 1148 1142 1136 1136 1135 1128 1140 1130 1131 1127 18.30 98.4%
Range:10-20 µm 1635 1628 1616 1590 1594 1619 1607 1583 1606 1610 1621 1623 1611 15.15 99.1%
Range:20-99 µm 385 387 390 395 393 393 386 394 390 385 380 377 388 5.41 98.6%
Range:0-10 µm 476 477 463 484 481 489 500 479 492 491 481 482 483 9.04 98.1%
Range:10-20 µm 1084 1085 1086 1076 1080 1078 1067 1072 1071 1070 1074 1074 1076 5.98 99.4%
Range:20-99 µm 158 158 161 157 157 153 156 155 153 155 155 151 156 2.59 98.3%
Range:0-10 µm 552 555 553 558 563 561 561 559 558 549 558 562 557 4.15 99.3%
Range:10-20 µm 184 184 184 187 186 184 185 187 187 186 183 181 185 1.77 99.0%
Range:20-99 µm 97 99 98 97 99 99 98 97 96 98 99 98 98 0.95 99.0%
Range:0-10 µm 506 506 509 523 512 542 542 545 550 552 550 551 532 18.57 96.5%
Range:10-20 µm 488 491 485 477 484 464 469 461 453 456 454 448 469 14.63 96.9%
Range:20-99 µm 255 252 248 245 241 243 242 239 238 236 233 226 242 7.70 96.8%
• Test procedure: Multiple inspections of same photomask in Class 1000 environment.
Four different photomasks tested.
• Objective: Measure system repeatability
• Conclusion: System very repeatable in all three particle ranges.

20. 5-Feb-15 Page 20
Position and Size Repeatability
Position and Size Repeatability
Colors: indicate reported size
Dots: first inspection position
Circles: second inspection position
Arrows: particles which moved
between inspections
“new”: particles deposited between
inspections
“off”: particles removed between
inspections
NOTE: Data taken in class 10000
environment

21. 5-Feb-15 Page 21
PDS-1020G2 Front Dimensions
10.444” On Centerline
9.725” to bottom of reticle glass
surface

22. 5-Feb-15 Page 22
System Drift
0
50
100
150
200
250
300
350
400
450
500
0 5 10 15 20 25 30 35
RangeCount
Approximate Elapsed Time (min)
Timeline
0-14 Microns
15-99 Microns
20-99 Microns
• Test procedure: Multiple inspections of same photo mask in Class 1000 environment.
• Objective: To characterize system drift over time.
• Conclusion: No noticeable drift, other than expected statistical environmental drifts.

23. 5-Feb-15 Page 23
Response Uniformity
Log(Count) vs. Log(Size)
y = -1.7401x + 3.9033
0.00
0.50
1.00
1.50
2.00
2.50
3.00
3.50
0.00 0.50 1.00 1.50 2.00
Log(Size µm)
Log(#Particles)
• Test procedure: Inspection
of photo mask exposed to
ambient air for 2 minutes.
• Objective: To determine
uniformity of response as a
function of particle size.
• Conclusion: System
response is linear with
particle size.

24. 5-Feb-15 Page 24
Particle Density Map
1 2 3 4 5 6 7 8 9 10
S1
S2
S3
S4
S5
S6
S7
S8
S9
S10
0100200300
400
Sample Particle Density Map
300-400
200-300
100-200
0-100
• Test procedure: Inspection of
photo mask exposed to ambient air
for 2 minutes.
• Objective: To demonstrate particle
mapping capability
• Conclusion: With proper software
(not included), system can deliver
particle density map.

25. 5-Feb-15 Page 25
Calculated Radiometric Response
Radiant Intensity vs. Diameter
1.00E-15
1.00E-14
1.00E-13
1.00E-12
1.00E-11
1.00E-10
1.00E-09
1.00E-08
1.00E-07
1.00E-06
1.00E-05
0.1 1 10 100 1000
Diameter (µm)
RadiantIntensity(W/Sr)
0.4 µm Light 0.5 µm Light 0.63 µm Light
Theoretical Analysis
• Objective: To estimate theoretical
particle size detection limit of PDS-
1020G2.
• Conclusion: PDS-1020G2 with
appropriate modifications is capable
of sub-micron particle detection.

26. 5-Feb-15 Page 26
Counted Particles vs. Threshold
0
1000
2000
3000
4000
5000
6000
7000
8000
9000
0 500 1000 1500 2000 2500 3000 3500
Threshold
TotalCount
• Test procedure: Inspection of
photo mask exposed to ambient
air for 2 minutes.
• Objective: To determine noise
threshold of system.
• Conclusion: Threshold can be
varied to adjust system
sensitivity to particle size.
(Note: system/ambient noise is
generally found to the left of
vertical line)
« Noise Threshold
Noise Threshold

27. 5-Feb-15 Page 27
Contact Info
Wafer Inspection Services, Inc.
www.waferinspectionservices.com
1-508-944-2851
Sales@wis-inc.net